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There are 122802 results for: content related to: Fabrication of Ceramic-Ceramic Composites by Chemical Vapor Deposition

  1. Zum Chemischen Transport der Titansilicide mit Chlor und lod

    Zeitschrift für anorganische und allgemeine Chemie

    Volume 560, Issue 1, Mai 1988, Pages: 128–140, Dr. Do Vuong Hoanh, Dr. W. Bieger and Dr. G. Krabbes

    Version of Record online : 9 NOV 2004, DOI: 10.1002/zaac.19885600115

  2. Processing and Properties of TiB2 and ZrB2 with Sinter-Additives

    Advanced Structural Ceramics

    Bikramjit Basu, Kantesh Balani, Pages: 286–304, 2011

    Published Online : 7 OCT 2011, DOI: 10.1002/9781118037300.ch14

  3. Formation of Shallow p+ -n Junctions by B+ Implantation through a TiSi2 Screen Film

    physica status solidi (a)

    Volume 137, Issue 1, 16 May 1993, Pages: K21–K24, Xi-Mao Bao, Hai Yan and Bao-Hua Mao

    Version of Record online : 15 FEB 2006, DOI: 10.1002/pssa.2211370131

  4. Untersuchungen zum Isothermen Schnitt des Systems Ti[BOND]Si[BOND]O bei 1273 K

    Zeitschrift für anorganische und allgemeine Chemie

    Volume 558, Issue 1, März 1988, Pages: 41–45, Dr. sc. G. Krabbes, Dr. R. Krausze and Dr. Do. Vuong Hoanh

    Version of Record online : 9 NOV 2004, DOI: 10.1002/zaac.19885580105

  5. Angular dependence of sputtering yield of TiSi2 layers and analysis of titanium disilicide by SIMS and SCANIIR methods

    Surface and Interface Analysis

    Volume 14, Issue 11, November 1989, Pages: 697–699, S. L. Antonov, K. A. Valiev, A. G. Vasiliev and A. A. Orlikovsky

    Version of Record online : 15 SEP 2004, DOI: 10.1002/sia.740141104

  6. TiSi2 nanostructures – enhanced conductivity at nanoscale?

    physica status solidi (b)

    Volume 244, Issue 10, October 2007, Pages: 3593–3600, Andrey N. Enyashin and Sibylle Gemming

    Version of Record online : 6 JUL 2007, DOI: 10.1002/pssb.200743109

  7. Simultaneous Chemical Vapor Deposition of SiC-Dispersed Phase Composites

    Proceedings of the 9th Annual Conference on Composites and Advanced Ceramic Materials: Ceramic Engineering and Science Proceedings, Volume 6, Issue 7/8

    D. P. Stinton, W. J. Lackey, Pages: 707–713, 2008

    Published Online : 26 MAR 2008, DOI: 10.1002/9780470320280.ch23

  8. Formation of TiSi2/n + /p-Silicon Junctions by Implantation through Metal Technique

    physica status solidi (a)

    Volume 140, Issue 1, 16 November 1993, Pages: 283–293, N. M. Ravindra, Ying Wu, B. Shah, W. Savin, T. Fink, R. T. Lareau and R. L. Pfeffer

    Version of Record online : 16 FEB 2006, DOI: 10.1002/pssa.2211400128

  9. Polar-Oriented Crystallization of Fresnoite (Ba2TiSi2O8) on Glass Surface Due to Ultrasonic Treatment with Suspensions

    Journal of the American Ceramic Society

    Volume 77, Issue 11, November 1994, Pages: 2905–2910, Yong Ding, Yoshinari Miura and Akiyoshi Osaka

    Version of Record online : 8 MAR 2005, DOI: 10.1111/j.1151-2916.1994.tb04522.x

  10. Effect of the phase transition of Ti silicide on the thermal stability of Si-interface in the Cu/CuTi2/Ti/Si contact system

    Electronics and Communications in Japan (Part II: Electronics)

    Volume 77, Issue 1, January 1994, Pages: 108–116, Takahiro Sasaki, Shinya Kagomi, Katsutaka Sasaki, Atsushi Noya and Ken'Ichi Yoshimoto

    Version of Record online : 22 MAR 2007, DOI: 10.1002/ecjb.4420770111

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    Thermal band selection for the PRISM instrument: 1. Analysis of emissivity-temperature separation algorithms

    Journal of Geophysical Research: Atmospheres (1984–2012)

    Volume 102, Issue D10, 27 May 1997, Pages: 11145–11164, Vicente Caselles, Enric Valor, César Coll, Eva Rubio

    Version of Record online : 1 MAY 1997, DOI: 10.1029/97JD00344

  12. Influence of contact hole profile and underlayer materials on aluminum reflow filling properties

    Electronics and Communications in Japan (Part II: Electronics)

    Volume 79, Issue 2, 1996, Pages: 109–117, Nobukazu Ito, Yoshiaki Yamada, Kuniko Kikuta, Takamaro Kikkawan and Donald Tai-Chan Huo

    Version of Record online : 23 MAR 2007, DOI: 10.1002/ecjb.4420790211

  13. High-Temperature Mechanical and Oxidation Properties

    Advanced Structural Ceramics

    Bikramjit Basu, Kantesh Balani, Pages: 305–320, 2011

    Published Online : 7 OCT 2011, DOI: 10.1002/9781118037300.ch15

  14. K2TiSi3O9·H2O

    Acta Crystallographica Section C

    Volume 56, Issue 7, July 2000, Pages: 738–739, Xiaodong Zou and Mike S. Dadachov

    DOI: 10.1107/S010827010000545X

  15. The influence of oxide surface layers on bulk electron probe microanalysis of oxygen—application to Ti-Si-O compounds

    Scanning

    Volume 15, Issue 3, 1993, Pages: 165–170, Dr. J. I. Goldstein, S. K. Choi, F. J. J. Van Loo, H. J. M. Heijligers, G. F. Bastin and W. G. Sloof

    Version of Record online : 9 AUG 2011, DOI: 10.1002/sca.4950150310

  16. Rapid thermal stability of refractory metal and silicide contacts on p-InP

    physica status solidi (a)

    Volume 143, Issue 2, 16 June 1994, Pages: 367–372, G. Eftekhari

    Version of Record online : 15 FEB 2006, DOI: 10.1002/pssa.2211430221

  17. Self-Propagating High Temperature Synthesis of Ceramics in Vacuum

    Proceedings of the 7th Annual Conference on Composites and Advanced Ceramic Materials: Ceramic Engineering and Science Proceedings, Volume 4, Issue 7/8

    William F. Henshaw, Andrus Nöler, Thomas Leete, Pages: 634–645, 2008

    Published Online : 26 MAR 2008, DOI: 10.1002/9780470320129.ch14

  18. Densification, Sintering Reactions, and Properties of Titanium Diboride With Titanium Disilicide as a Sintering Aid

    Journal of the American Ceramic Society

    Volume 90, Issue 11, November 2007, Pages: 3415–3423, G. Brahma Raju and Bikramjit Basu

    Version of Record online : 14 SEP 2007, DOI: 10.1111/j.1551-2916.2007.01911.x

  19. Silicon Device Processing

    Handbook of Semiconductor Technology Set

    Kenneth A. Jackson, Wolfgang Schröter, Pages: 407–487, 2008

    Published Online : 4 JUN 2008, DOI: 10.1002/9783527619290.ch9a

  20. Characterization of TiN/TiSi2 bilayer formed by sputter deposition from a TiN0.4 alloy target and subsequent lamp annealing and its application to a contact system

    Electronics and Communications in Japan (Part II: Electronics)

    Volume 79, Issue 1, 1996, Pages: 101–109, Hiroki Nakamura and Kimihisa Fushimi

    Version of Record online : 23 MAR 2007, DOI: 10.1002/ecjb.4420790111