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There are 7850655 results for: content related to: Microporous ZrO 2 Membrane Preparation by Liquid-Injection MOCVD

  1. Deposition of Lanthanum Zirconium Oxide High-k Films by Liquid Injection ALD and MOCVD

    Chemical Vapor Deposition

    Volume 13, Issue 12, December, 2007, Pages: 684–690, J. M. Gaskell, A. C. Jones, P. R. Chalker, M. Werner, H. C. Aspinall, S. Taylor, P. Taechakumput and P. N. Heys

    Version of Record online : 7 DEC 2007, DOI: 10.1002/cvde.200706637

  2. Growth of HfO2 by Liquid Injection MOCVD and ALD Using New Hafnium-Cyclopentadienyl Precursors

    Chemical Vapor Deposition

    Volume 13, Issue 11, November, 2007, Pages: 609–617, R. O'Kane, J. Gaskell, A. C. Jones, P. R. Chalker, K. Black, M. Werner, P. Taechakumput, S. Taylor, P. N. Heys and R. Odedra

    Version of Record online : 20 NOV 2007, DOI: 10.1002/cvde.200706589

  3. An MOCVD Approach to High-k Praseodymium-Based Films

    Chemical Vapor Deposition

    Volume 12, Issue 2-3, March, 2006, Pages: 109–124, R. Lo Nigro, G. Malandrino, R. G. Toro and I. L. Fragalà

    Version of Record online : 22 MAR 2006, DOI: 10.1002/cvde.200500382

  4. MOCVD and ALD of High-k Dielectric Oxides Using Alkoxide Precursors

    Chemical Vapor Deposition

    Volume 12, Issue 2-3, March, 2006, Pages: 83–98, A. C. Jones, H. C. Aspinall, P. R. Chalker, R. J. Potter, T. D. Manning, Y. F. Loo, R. O'Kane, J. M. Gaskell and L. M. Smith

    Version of Record online : 22 MAR 2006, DOI: 10.1002/cvde.200500023

  5. Subject Index (Chem. Vap. Deposition 2007, Vol. 13)

    Chemical Vapor Deposition

    Volume 13, Issue 12, December, 2007, Pages: 721–728,

    Version of Record online : 7 DEC 2007, DOI: 10.1002/cvde.200790039

  6. An investigation into the growth of magnesium niobium oxide and lead magnesium niobate by liquid-injection MOCVD using a magnesium–niobium alkoxide precursor

    Advanced Materials for Optics and Electronics

    Volume 10, Issue 3-5, May - October 2000, Pages: 177–182, Hywell O Davies, Anthony C Jones, Timothy J Leedham, Peter J Wright, Michael J Crosbie, Penelope A Lane, Alexander Steiner and Jamie Bickley

    Version of Record online : 23 FEB 2001, DOI: 10.1002/1099-0712(200005/10)10:3/5<177::AID-AMO410>3.0.CO;2-B

  7. Subject Index Chem. Vap. Deposition 2006

    Chemical Vapor Deposition

    Volume 12, Issue 12, December, 2006, Pages: 761–766,

    Version of Record online : 19 DEC 2006, DOI: 10.1002/cvde.200690029

  8. Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2

    Chemical Vapor Deposition

    Volume 16, Issue 1-3, March 2010, Pages: 93–99, Kate Black, Anthony C. Jones, John Bacsa, Paul R. Chalker, Paul A. Marshall, Hywel O. Davies, Peter N. Heys, Paul O'Brien, Mohammad Afzaal, James Raftery and Gary W. Critchlow

    Version of Record online : 22 MAR 2010, DOI: 10.1002/cvde.200906818

  9. MOCVD of Electroceramic Oxides: A Precursor Manufacturer′s Perspective

    Chemical Vapor Deposition

    Volume 4, Issue 5, October 1998, Pages: 169–179, Anthony C. Jones

    Version of Record online : 16 DEC 1998, DOI: 10.1002/(SICI)1521-3862(199810)04:05<169::AID-CVDE169>3.0.CO;2-6

  10. Microporous ZrO2 Membrane Preparation by Liquid-Injection MOCVD

    Progress in Nanotechnology

    S. Mathur, E. Hemmer, S. Barth, J. Altmayer, N. Donia, I. Kumakiri, N. Lecerf, R. Bredesen, Pages: 157–167, 2014

    Published Online : 11 AUG 2014, DOI: 10.1002/9780470588246.ch25

  11. Crystal Structure of Bi(OCMe2CH2OMe)3 and Its Use in the MOCVD of Bi2O3

    Chemical Vapor Deposition

    Volume 7, Issue 5, September, 2001, Pages: 205–209, P. A. Williams, A. C. Jones, M. J. Crosbie, P. J. Wright, J. F. Bickley, A. Steiner, H. O. Davies, T. J. Leedham and G. W. Critchlow

    Version of Record online : 30 AUG 2001, DOI: 10.1002/1521-3862(200109)7:5<205::AID-CVDE205>3.0.CO;2-9

  12. Liquid Injection MOCVD of Zirconium Dioxide Using a Novel Mixed Ligand Zirconium Precursor

    Chemical Vapor Deposition

    Volume 4, Issue 5, October 1998, Pages: 197–201, Anthony C. Jones, Timothy J. Leedham, Peter J. Wright, Michael J. Crosbie, Dennis J. Williams, Kirsty A. Fleeting, Hywel O. Davies, David J. Otway and Paul O′Brien

    Version of Record online : 16 DEC 1998, DOI: 10.1002/(SICI)1521-3862(199810)04:05<197::AID-CVDE197>3.0.CO;2-2

  13. Synthesis and Structural Characterization of a Novel Magnesium β-Diketonatoalkoxide Complex: A New Precursor for the MOCVD of MgO

    Chemical Vapor Deposition

    Volume 6, Issue 2, April, 2000, Pages: 71–75, H. O. Davies, A. C. Jones, T. J. Leedham, M. J. Crosbie, P. J. Wright, N. M. Boag and J. R. Thompson

    Version of Record online : 3 APR 2000, DOI: 10.1002/(SICI)1521-3862(200004)6:2<71::AID-CVDE71>3.0.CO;2-#

  14. Developing the Chemistry of Novel Scandium β-Diketonates for the MOCVD of Scandium-Containing Oxides

    Chemical Vapor Deposition

    Volume 5, Issue 6, December, 1999, Pages: 261–264, K. A. Fleeting, H. O. Davies, A. C. Jones, P. O'Brien, T. J. Leedham, M. J. Crosbie, P. J. Wright and D. J. Williams

    Version of Record online : 26 NOV 1999, DOI: 10.1002/(SICI)1521-3862(199912)5:6<261::AID-CVDE261>3.0.CO;2-2

  15. MOCVD of Chalcogenides, Pnictides, and Heterometallic Compounds from Single-Source Molecule Precursors

    Chemical Vapor Deposition

    Volume 6, Issue 4, August, 2000, Pages: 155–173, A. N. Gleizes

    Version of Record online : 28 JUL 2000, DOI: 10.1002/1521-3862(200008)6:4<155::AID-CVDE155>3.0.CO;2-Y

  16. Growth by Liquid-Injection MOCVD and Properties of HfO2 Films for Microelectronic Applications

    Chemical Vapor Deposition

    Volume 12, Issue 2-3, March, 2006, Pages: 187–192, C. Dubourdieu, E. Rauwel, C. Millon, P. Chaudouët, F. Ducroquet, N. Rochat, S. Rushworth and V. Cosnier

    Version of Record online : 22 MAR 2006, DOI: 10.1002/cvde.200506397

  17. MOCVD of Strontium Tantalate Thin Films Using Novel Bimetallic Alkoxide Precursors

    Chemical Vapor Deposition

    Volume 5, Issue 1, January, 1999, Pages: 9–12, Michael J. Crosbie, Peter J. Wright, Hywel O. Davies, Anthony C. Jones, Timothy J. Leedham, Paul O'Brien and Gary W. Critchlow

    Version of Record online : 9 FEB 1999, DOI: 10.1002/(SICI)1521-3862(199901)5:1<9::AID-CVDE9>3.0.CO;2-B

  18. Comparison of ZrxTi1−xO4 films produced by PLD and MOCVD techniques

    Surface and Interface Analysis

    Volume 36, Issue 8, August 2004, Pages: 1151–1154, S. Kaciulis, A. Cusmà, G. Padeletti, L. Pandolfi, M. Viticoli and C. Zaldo

    Version of Record online : 12 AUG 2004, DOI: 10.1002/sia.1863

  19. Process-structure-properties relationship in direct liquid injection chemical vapor deposition of amorphous alumina from aluminum tri-isopropoxide

    physica status solidi (c)

    Volume 12, Issue 7, July 2015, Pages: 944–952, Pierre-Luc Etchepare, Loïc Baggetto, Hugues Vergnes, Diane Samélor, Daniel Sadowski, Brigitte Caussat and Constantin Vahlas

    Version of Record online : 26 MAY 2015, DOI: 10.1002/pssc.201510037

  20. Atomic Layer-by-Layer MOCVD of Complex Metal Oxides and In Situ Process Monitoring

    Chemical Vapor Deposition

    Volume 7, Issue 1, January, 2001, Pages: 7–18, S. Yamamoto and S Oda

    Version of Record online : 24 JAN 2001, DOI: 10.1002/1521-3862(200101)7:1<7::AID-CVDE7>3.0.CO;2-L