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There are 49711 results for: content related to: Chemical Vapor Deposition of Tungsten

  1. Tungsten

    Critical Metals Handbook

    Teresa Brown, Peter Pitfield, Pages: 385–413, 2013

    Published Online : 27 DEC 2013, DOI: 10.1002/9781118755341.ch16

  2. TUNGSTEN CMP PROCESSES

    Chemical Mechanical Planarization of Microelectronic Materials

    Joseph M. Steigerwald, Shyam P. Murarka, Ronald J. Gutmann, Pages: 181–208, 2007

    Published Online : 21 DEC 2007, DOI: 10.1002/9783527617746.ch6

  3. Silicon Device Processing

    Handbook of Semiconductor Technology Set

    Kenneth A. Jackson, Wolfgang Schröter, Pages: 407–487, 2008

    Published Online : 4 JUN 2008, DOI: 10.1002/9783527619290.ch9a

  4. Silicon Device Processing

    Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

    Kenneth A. Jackson, Wolfgang Schröter, Pages: 407–487, 2008

    Published Online : 28 MAY 2008, DOI: 10.1002/9783527621828.ch9

  5. Silicon Device Processing

    Silicon Devices: Structures and Processing

    Kenneth A. Jackson, Pages: 113–193, 2007

    Published Online : 21 DEC 2007, DOI: 10.1002/9783527611805.ch3

  6. Tungsten in biological systems

    FEMS Microbiology Reviews

    Volume 18, Issue 1, March 1996, Pages: 5–63, Arnulf Kletzin and Michael W.W. Adams

    Version of Record online : 17 JAN 2006, DOI: 10.1111/j.1574-6976.1996.tb00226.x

  7. Incorporation and migration of phosphorus species within anodic films on an Al-W alloy

    Surface and Interface Analysis

    Volume 43, Issue 5, May 2011, Pages: 893–902, S. J. Garcia-Vergara, I. S. Molchan, F. Zhou, H. Habazaki, D. Kowalski, P. Skeldon and G. E. Thompson

    Version of Record online : 9 JUL 2010, DOI: 10.1002/sia.3651

  8. Tungsten, the Surprisingly Positively Acting Heavy Metal Element for Prokaryotes

    Annals of the New York Academy of Sciences

    Volume 1125, Issue 1, March 2008, Pages: 215–229, Jan R. Andreesen and Kathrin Makdessi

    Version of Record online : 26 MAR 2008, DOI: 10.1196/annals.1419.003

  9. Multi-level metallization: Future prospects

    European Transactions on Telecommunications

    Volume 1, Issue 2, March/April 1990, Pages: 185–194, E. H. A. Crannernan

    Version of Record online : 12 SEP 2008, DOI: 10.1002/ett.4460010218

  10. Chemical vapor deposition of metals: Part 1. An overview of CVD processes

    Chemical Vapor Deposition

    Volume 1, Issue 1, July 1995, Pages: 8–23, Prof. Mark J. Hampden-Smith and Prof. Toivo T. Kodas

    Version of Record online : 14 SEP 2004, DOI: 10.1002/cvde.19950010103

  11. Microstructure and Strength of Shock Synthesized and Densified Tungsten Heavy Alloys

    Powder Materials: Current Research and Industrial Practices III

    Fernand D.S. Marquis, Anirudha Mahajan, Pages: 139–156, 2014

    Published Online : 16 JUN 2014, DOI: 10.1002/9781118984239.ch15

  12. Chemical Vapor Deposition of Aluminum

    The Chemistry of Metal CVD

    Michael G. Simmonds, Wayne L. Gladfelter, Pages: 45–103, 2007

    Published Online : 26 DEC 2007, DOI: 10.1002/9783527615858.ch2

  13. Influence of Wafer Preclean before Selective Tungsten CVD on Surface Properties of Interconnect and Intermetal Dielectric Materials

    physica status solidi (a)

    Volume 145, Issue 2, 16 October 1994, Pages: 311–318, S. E. Schulz, B. Hintze, W. Grünewald and A. Hofmann

    Version of Record online : 17 FEB 2006, DOI: 10.1002/pssa.2211450211

  14. Tungsten-Fiber-Reinforced Superalloys—A Status Review

    Proceedings of the 5th Annual Conference on Composites and Advanced Ceramic Materials: Ceramic Engineering and Science Proceedings, Volume 2, Issue 7/8

    Donald W. Petrasek, Robert A. Signorelli, Pages: 739–786, 2008

    Published Online : 26 MAR 2008, DOI: 10.1002/9780470291092.ch25

  15. A Review on Alloying in Tungsten Heavy Alloys

    Supplemental Proceedings: Materials Processing and Interfaces, Volume 1

    Animesh Bose, Rajendra Sadangi, Randall M. German, Pages: 453–465, 2012

    Published Online : 18 MAY 2012, DOI: 10.1002/9781118356074.ch59

  16. Introduction

    The Chemistry of Metal CVD

    Rahul Jairath, Ajay Jain, Robert D. Tolles, Mark J. Hampden-Smith, Toivo T. Kodas, Pages: 1–43, 2007

    Published Online : 26 DEC 2007, DOI: 10.1002/9783527615858.ch1

  17. On a small error in SRM640, SRM640a and SRM640b lattice parameters

    Journal of Applied Crystallography

    Volume 26, Issue 2, April 1993, Pages: 272–276, D. Yoder-Short

    DOI: 10.1107/S0021889892011610

  18. Adsorbed barium films on tungsten and molybdenum (011) face

    physica status solidi (a)

    Volume 13, Issue 2, 16 October 1972, Pages: 445–456, A. G. Fedorus, A. G. Naumovets and Yu. S. Vedula

    Version of Record online : 17 FEB 2006, DOI: 10.1002/pssa.2210130213

  19. Quantitative analysis of W(N), TiW and TiW(N) matrices using XPS, AES, RBS, EPMA and XRD

    Surface and Interface Analysis

    Volume 17, Issue 6, June 1991, Pages: 373–382, J. L. Alay, H. Bender, G. Brijs, A. Demesmaeker and W. Vandervorst

    Version of Record online : 15 SEP 2004, DOI: 10.1002/sia.740170613

  20. THE LIFE HISTORY OF ADSORBED ATOMS, IONS, AND MOLECULES

    Annals of the New York Academy of Sciences

    Volume 58, Issue 6, September 1954, Pages: 723–740, Joseph A. Becker

    Version of Record online : 15 DEC 2006, DOI: 10.1111/j.1749-6632.1954.tb45870.x