Search Results

There are 19826 results for: content related to: Preparation and characterization of molecular photoresists: Crosslinkable positive and water developable negative tones

  1. Photolithography

    Standard Article

    Materials Science and Technology

    Rainer Leuschner and Georg Pawlowski

    Published Online : 15 FEB 2013, DOI: 10.1002/9783527603978.mst0258

  2. Negative-working photoresist based on a first-generation dendrimer consisting of 4,4-diphenylpentyloxy units

    Journal of Polymer Science Part A: Polymer Chemistry

    Volume 43, Issue 6, 15 March 2005, Pages: 1210–1215, Yasushi Kamimura, Osamu Haba, Takeshi Endo and Mitsuru Ueda

    Version of Record online : 3 FEB 2005, DOI: 10.1002/pola.20608

  3. Water-Developable Poly(2-oxazoline)-Based Negative Photoresists

    Macromolecular Rapid Communications

    Volume 33, Issue 5, March 16, 2012, Pages: 396–400, Verena Schenk, Lisa Ellmaier, Elisabeth Rossegger, Matthias Edler, Thomas Griesser, Gerald Weidinger and Frank Wiesbrock

    Version of Record online : 19 JAN 2012, DOI: 10.1002/marc.201100717

  4. A water-developable negative photoresist based on the photocrosslinking of N-phenylamide groups with reduced environmental impact

    Journal of Applied Polymer Science

    Volume 86, Issue 5, 31 October 2002, Pages: 1172–1180, Kyu Ho Chae, Gum Ju Sun, Jin Koo Kang and Taek Hyeon Kim

    Version of Record online : 20 AUG 2002, DOI: 10.1002/app.11060

  5. Imaging Technology, 4. Imaging for Electronics

    Standard Article

    Ullmann's Encyclopedia of Industrial Chemistry

    Hartmut Steppan, Donald C. Mammato, Thomas Stoudt and Michael C. P. Watts

    Published Online : 15 OCT 2011, DOI: 10.1002/14356007.o13_o10

  6. Photoresist Latent and Developer Images as Probed by Neutron Reflectivity Methods

    Advanced Materials

    Volume 23, Issue 3, January 18, 2011, Pages: 388–408, Vivek M. Prabhu, Shuhui Kang, David L. VanderHart, Sushil K. Satija, Eric K. Lin and Wen-li Wu

    Version of Record online : 16 SEP 2010, DOI: 10.1002/adma.201001762

  7. The effect of soft bake on adhesion property between SU-8 photoresist and Ni substrate by molecular dynamics simulation

    Journal of Applied Polymer Science

    Volume 127, Issue 6, 15 March 2013, Pages: 4456–4462, Xiaolei Zhang, Liqun Du and Zheng Xu

    Version of Record online : 6 JUN 2012, DOI: 10.1002/app.38011

  8. Simple Holographic Patterning for High-Aspect-Ratio Three-Dimensional Nanostructures with Large Coverage Area

    Advanced Functional Materials

    Volume 23, Issue 5, February 5, 2013, Pages: 608–618, Ishan Wathuthanthri, Yuyang Liu, Ke Du, Wei Xu and Chang-Hwan Choi

    Version of Record online : 7 SEP 2012, DOI: 10.1002/adfm.201201814

  9. Aqueous developable dual switching photoresists for nanolithography

    Journal of Polymer Science Part A: Polymer Chemistry

    Volume 50, Issue 20, 15 October 2012, Pages: 4255–4265, Lan Chen, Yong Keng Goh, Han Hao Cheng, Bruce W. Smith, Peng Xie, Warren Montgomery, Andrew K. Whittaker and Idriss Blakey

    Version of Record online : 16 JUL 2012, DOI: 10.1002/pola.26232

  10. Synthesis and characterization of a positive-working, aqueous-base-developable photosensitive polyimide precursor

    Journal of Applied Polymer Science

    Volume 86, Issue 2, 10 October 2002, Pages: 352–358, Steve Lien-Chung Hsu, Po-I Lee, Jinn-Shing King and Jyh-Long Jeng

    Version of Record online : 30 JUL 2002, DOI: 10.1002/app.10969

  11. Synthesis and micropatterning properties of a novel base-soluble, positive-working, photosensitive polyimide having an o-nitrobenzyl ether group

    Journal of Polymer Science Part A: Polymer Chemistry

    Volume 45, Issue 5, 1 March 2007, Pages: 776–788, Gyo Jic Shin, Jin Chul Jung, Jun Ho Chi, Tae Hwan Oh and Jin Beak Kim

    Version of Record online : 5 JAN 2007, DOI: 10.1002/pola.21833

  12. Photolithography

    Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

    Rainer Leuschner, Georg Pawlowski, Pages: 177–263, 2008

    Published Online : 28 MAY 2008, DOI: 10.1002/9783527621828.ch4

  13. Positive-working aqueous base developable photosensitive polybenzoxazole precursor/organoclay nanocomposites

    Journal of Applied Polymer Science

    Volume 97, Issue 6, 15 September 2005, Pages: 2350–2356, Steve Lien-Chung Hsu, Chi-Yi Lin and Shih-Wei Chuang

    Version of Record online : 29 JUN 2005, DOI: 10.1002/app.21801

  14. Photolithography

    Handbook of Semiconductor Technology Set

    Rainer Leuschner, Georg Pawlowski, Pages: 177–263, 2008

    Published Online : 4 JUN 2008, DOI: 10.1002/9783527619290.ch4a

  15. Photolithography Materials

    Standard Article

    Handbook of Chemicals and Gases for the Semiconductor Industry

    Ashutosh Misra, Jeremiah D. Hogan and Russell Chorush

    Published Online : 15 JUL 2002, DOI: 10.1002/0471263850.mis045

  16. Study on advanced nanoscale near-field photolithography

    Scanning

    Volume 32, Issue 6, November/December 2010, Pages: 351–360, Ching-Been Yang, Hsiu-Lu Chiang and Jen-Ching Huang

    Version of Record online : 22 OCT 2010, DOI: 10.1002/sca.20204

  17. Laser nanofabrication in photoresists and azopolymers

    Laser & Photonics Reviews

    Volume 8, Issue 1, January 2014, Pages: 1–26, Zouheir Sekkat and Satoshi Kawata

    Version of Record online : 12 MAR 2013, DOI: 10.1002/lpor.201200081

  18. Synthesis and photoinduced deprotection of calixarene derivatives containing certain protective groups

    Journal of Polymer Science Part A: Polymer Chemistry

    Volume 39, Issue 9, 1 May 2001, Pages: 1481–1494, Tadatomi Nishikubo, Atsushi Kameyama, Kousuke Tsutsui and Shinichi Kishimoto

    Version of Record online : 22 MAR 2001, DOI: 10.1002/pola.1125

  19. Photocurable positive photoresist-comprising copolymers having pendant alkoxy ethyl moieties

    Journal of Applied Polymer Science

    Volume 83, Issue 4, 24 January 2002, Pages: 889–897, Jui-Hsiang Liu and Jen-Chieh Shih

    Version of Record online : 20 NOV 2001, DOI: 10.1002/app.10105

  20. Photoinduced mesoporosity of Tert-butoxycarbonyl acrylic photosensitive material with low dielectric constant

    Journal of Applied Polymer Science

    Volume 127, Issue 4, 15 February 2013, Pages: 3269–3277, Song-Shiang Lin, Yu-Jen Chan and Yu-Der Lee

    Version of Record online : 10 JUN 2012, DOI: 10.1002/app.37526