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There are 4796 results for: content related to: Contents: (Chem. Vap. Deposition 1–2–3/2010)

  1. Contents: (Chem. Vap. Deposition 1–2–3/2013)

    Chemical Vapor Deposition

    Volume 19, Issue 4-6, June 2013, Pages: 75–79,

    Article first published online : 17 JUN 2013, DOI: 10.1002/cvde.201390003

  2. Recent Developments of Atomic Layer Deposition Processes for Metallization

    Chemical Vapor Deposition

    Volume 19, Issue 4-6, June 2013, Pages: 82–103, Dr. Wei-Min Li

    Article first published online : 21 MAY 2013, DOI: 10.1002/cvde.201300052

  3. Contents: (Chem. Vap. Deposition 1–2–3/2013)

    Chemical Vapor Deposition

    Volume 19, Issue 1-3, March 2013, Pages: 1–3,

    Article first published online : 11 MAR 2013, DOI: 10.1002/cvde.201390000

  4. MOCVD and ALD of High-k Dielectric Oxides Using Alkoxide Precursors

    Chemical Vapor Deposition

    Volume 12, Issue 2-3, March, 2006, Pages: 83–98, A. C. Jones, H. C. Aspinall, P. R. Chalker, R. J. Potter, T. D. Manning, Y. F. Loo, R. O'Kane, J. M. Gaskell and L. M. Smith

    Article first published online : 22 MAR 2006, DOI: 10.1002/cvde.200500023

  5. Contents: (Chem. Vap. Deposition 4–5–6/2012)

    Chemical Vapor Deposition

    Volume 18, Issue 4-6, June 2012, Pages: 83–86,

    Article first published online : 6 JUN 2012, DOI: 10.1002/cvde.201290003

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    CVD on Optical Fibers: Tilted Fiber Bragg Gratings as Real-time Sensing Platforms

    Chemical Vapor Deposition

    Volume 21, Issue 1-2-3, March 2015, Pages: 4–20, David J. Mandia, Wenjun Zhou, Jacques Albert and Seán T. Barry

    Article first published online : 8 OCT 2014, DOI: 10.1002/cvde.201400059

  7. Contents: (Chem. Vap. Deposition 1–2–3/2011)

    Chemical Vapor Deposition

    Volume 17, Issue 1-3, March 2011, Pages: 3–5,

    Article first published online : 16 MAR 2011, DOI: 10.1002/cvde.201190001

  8. Contents: (Chem. Vap. Deposition 7–8–9/2012)

    Chemical Vapor Deposition

    Volume 18, Issue 7-9, September 2012, Pages: 179–181,

    Article first published online : 5 SEP 2012, DOI: 10.1002/cvde.201290006

  9. You have free access to this content
    Chem. Vap. Deposition (1–2–3/2015)

    Chemical Vapor Deposition

    Volume 21, Issue 1-2-3, March 2015, Pages: 1–3,

    Article first published online : 3 MAR 2015, DOI: 10.1002/cvde.201571233

  10. Contents: (Chem. Vap. Deposition 10–11–12/2012)

    Chemical Vapor Deposition

    Volume 18, Issue 10-12, December 2012, Pages: 263–266,

    Article first published online : 6 DEC 2012, DOI: 10.1002/cvde.201290009

  11. Contents: (Chem. Vap. Deposition 1–2–3/2012)

    Chemical Vapor Deposition

    Volume 18, Issue 1-3, March 2012, Pages: 3–5,

    Article first published online : 16 MAR 2012, DOI: 10.1002/cvde.201290000

  12. Growth of HfO2 by Liquid Injection MOCVD and ALD Using New Hafnium-Cyclopentadienyl Precursors

    Chemical Vapor Deposition

    Volume 13, Issue 11, November, 2007, Pages: 609–617, R. O'Kane, J. Gaskell, A. C. Jones, P. R. Chalker, K. Black, M. Werner, P. Taechakumput, S. Taylor, P. N. Heys and R. Odedra

    Article first published online : 20 NOV 2007, DOI: 10.1002/cvde.200706589

  13. An MOCVD Approach to High-k Praseodymium-Based Films

    Chemical Vapor Deposition

    Volume 12, Issue 2-3, March, 2006, Pages: 109–124, R. Lo Nigro, G. Malandrino, R. G. Toro and I. L. Fragalà

    Article first published online : 22 MAR 2006, DOI: 10.1002/cvde.200500382

  14. Atomic Layer Deposition of Tantalum Oxide and Tantalum Silicate from Chloride Precursors

    Chemical Vapor Deposition

    Volume 18, Issue 7-9, September 2012, Pages: 225–238, Christoph Adelmann, Annelies Delabie, Bart Schepers, Leonard N. J. Rodriguez, Alexis Franquet, Thierry Conard, Karl Opsomer, Inge Vaesen, Alain Moussa, Geoffrey Pourtois, Kristine Pierloot, Matty Caymax and Sven Van Elshocht

    Article first published online : 25 JUL 2012, DOI: 10.1002/cvde.201106967

  15. Processing and Applications of Aerosol-Assisted Chemical Vapor Deposition

    Chemical Vapor Deposition

    Volume 12, Issue 10, October, 2006, Pages: 583–596, X. Hou and K.-L. Choy

    Article first published online : 16 OCT 2006, DOI: 10.1002/cvde.200600033

  16. Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory

    Chemical Vapor Deposition

    Volume 19, Issue 1-3, March 2013, Pages: 4–14, Curtisha D. Travis and Raymond A. Adomaitis

    Article first published online : 18 FEB 2013, DOI: 10.1002/cvde.201206985

  17. MOCVD of Chalcogenides, Pnictides, and Heterometallic Compounds from Single-Source Molecule Precursors

    Chemical Vapor Deposition

    Volume 6, Issue 4, August, 2000, Pages: 155–173, A. N. Gleizes

    Article first published online : 28 JUL 2000, DOI: 10.1002/1521-3862(200008)6:4<155::AID-CVDE155>3.0.CO;2-Y

  18. CVD Production of Doped Titanium Dioxide Thin Films

    Chemical Vapor Deposition

    Volume 18, Issue 4-6, June 2012, Pages: 89–101, Charles W. Dunnill, Andreas Kafizas and Ivan P. Parkin

    Article first published online : 10 MAY 2012, DOI: 10.1002/cvde.201200048

  19. Zirconocene Alkoxides, Promising Precursors for MOCVD of Zirconium Dioxide Thin Films

    Chemical Vapor Deposition

    Volume 18, Issue 4-6, June 2012, Pages: 151–158, Andrea Sartori, Naida El Habra, Chiara De Zorzi, Sergio Sitran, Maurizio Casarin, Gianni Cavinato, Cinzia Sada, Rosalba Gerbasi and Gilberto Rossetto

    Article first published online : 8 MAY 2012, DOI: 10.1002/cvde.201106950

  20. The CVD of Nanodiamond Materials

    Chemical Vapor Deposition

    Volume 14, Issue 7-8, July/August 2008, Pages: 145–160, James E. Butler and Anirudha V. Sumant

    Article first published online : 15 AUG 2008, DOI: 10.1002/cvde.200700037