Search Results

There are 55151 results for: content related to: Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory

  1. A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High-Aspect-Ratio Nanopores

    Chemical Vapor Deposition

    Volume 17, Issue 10-12, December, 2011, Pages: 353–365, Raymond A. Adomaitis

    Article first published online : 15 DEC 2011, DOI: 10.1002/cvde.201106922

  2. Self-Limited Reaction-Diffusion in Nanostructured Substrates: Surface Coverage Dynamics and Analytic Approximations to ALD Saturation Times

    Chemical Vapor Deposition

    Volume 18, Issue 1-3, March 2012, Pages: 46–52, Angel Yanguas-Gil and Jeffrey W. Elam

    Article first published online : 13 MAR 2012, DOI: 10.1002/cvde.201106938

  3. The Growth Kinetics of Nickel Aluminide Coatings by the Bi-velocity Method

    Chemical Vapor Deposition

    Volume 18, Issue 10-12, December 2012, Pages: 267–273, Bartek Wierzba, Marek Danielewski, Katarzyna Tkacz-Śmiech and Jan Sieniawski

    Article first published online : 19 NOV 2012, DOI: 10.1002/cvde.201206999

  4. Modeling the Transport and Reaction Mechanisms of Copper Oxide CVD

    Chemical Vapor Deposition

    Volume 16, Issue 10-12, December, 2010, Pages: 336–345, David Arana-Chavez, Edward Toumayan, Federico Lora, Christopher McCaslin and Raymond A. Adomaitis

    Article first published online : 3 DEC 2010, DOI: 10.1002/cvde.201006873

  5. Effect of AACVD Processing Parameters on the Growth of Greenockite (CdS) Thin Films using a Single-Source Cadmium Precursor

    Chemical Vapor Deposition

    Volume 18, Issue 7-9, September 2012, Pages: 191–200, Muhammad Ali Ehsan, Huang Nay Ming, Misni Misran, Zainudin Arifin, Edward R. T. Tiekink, Ahmad P. Safwan, Mehdi Ebadi, Wan J. Basirun and Muhammad Mazhar

    Article first published online : 19 JUL 2012, DOI: 10.1002/cvde.201206988

  6. Growth and Optical Properties of Nonpolar (equation image) Zn1-xCoxO Epitaxial Film on a γ-LiAlO2 Substrate

    Chemical Vapor Deposition

    Volume 17, Issue 4-6, June, 2011, Pages: 88–92, Jih-Jen Wu, Sian-Jhang Lin, Wan-Hsien Lin, Mitch M.C. Chou, Liuwen Chang, Ten-Hsing Hwang, Chia-Hao Chuang and Chun-Wei Chen

    Article first published online : 1 JUN 2011, DOI: 10.1002/cvde.201006871

  7. Application of Carbon Nanotubes Directly Grown on Aluminum Foils as Electric Double Layer Capacitor Electrodes

    Chemical Vapor Deposition

    Volume 18, Issue 1-3, March 2012, Pages: 53–60, Vyacheslav O. Khavrus, Mathias Weiser, Marco Fritsch, Raghunandan Ummethala, Maria Grazia Salvaggio, Michael Schneider, Mihails Kusnezoff and Albrecht Leonhardt

    Article first published online : 5 MAR 2012, DOI: 10.1002/cvde.201106942

  8. Non-thermal Effect of Atmospheric-Pressure RF Cold Plasma on Photocatalytic Activity of As-deposited TiO2 Film

    Chemical Vapor Deposition

    Volume 18, Issue 4-6, June 2012, Pages: 121–125, Da-Lei Chang, Xiao-Song Li, Tian-Liang Zhao, Jin-Hua Yang and Ai-Min Zhu

    Article first published online : 18 MAY 2012, DOI: 10.1002/cvde.201106939

  9. Gas-Pulsed CVD for Film Growth in the Cu[BOND]Ni[BOND]N System

    Chemical Vapor Deposition

    Volume 18, Issue 1-3, March 2012, Pages: 10–16, Erik Lindahl, Mikael Ottosson and Jan-Otto Carlsson

    Article first published online : 16 MAR 2012, DOI: 10.1002/cvde.201106919

  10. Simulation of Chemical Vapor Infiltration and Deposition Based on 3D Images: A Local Scale Approach

    Chemical Vapor Deposition

    Volume 17, Issue 10-12, December, 2011, Pages: 312–320, William Ros, Gérard L. Vignoles, Christian Germain, Philippe Supiot and George Kokkoris

    Article first published online : 25 NOV 2011, DOI: 10.1002/cvde.201106895

  11. Fluorine-Free Superhydrophobic Microstructured Films Grown by PECVD

    Chemical Vapor Deposition

    Volume 17, Issue 7-9, September, 2011, Pages: 198–203, Vincent Rouessac, Andreea Ungureanu, Soumia Bangarda, André Deratani, Chia-Hao Lo, Ta-Chin Wei, Kueir-Rarn Lee and Juin-Yih Lai

    Article first published online : 31 AUG 2011, DOI: 10.1002/cvde.201106903

  12. [cis-(1,3-Diene)2W(CO)2] Complexes as MOCVD Precursors for the Deposition of Thin Tungsten – Tungsten Carbide Films

    Chemical Vapor Deposition

    Volume 16, Issue 7-9, September 2010, Pages: 239–247, Ilona Jipa, Frank W. Heinemann, Andreas Schneider, Nadejda Popovska, M. Aslam Siddiqi, Rehan A. Siddiqui, Burak Atakan, Hubertus Marbach, Christian Papp, Hans-Peter Steinrück and Ulrich Zenneck

    Article first published online : 27 AUG 2010, DOI: 10.1002/cvde.201006852

  13. Photocatalytic and Photoelectrocatalytic Degradation of the Explosive RDX by TiO2 Thin Films Prepared by CVD and Anodic Oxidation of Ti

    Chemical Vapor Deposition

    Volume 18, Issue 4-6, June 2012, Pages: 112–120, Fang Tian, Michael L. Hitchman and Sarkis H. Shamlian

    Article first published online : 16 MAY 2012, DOI: 10.1002/cvde.201207000

  14. Acetylene-Enhanced Growth of Carbon Nanotubes on Ceramic Microparticles for Multi-Scale Hybrid Structures

    Chemical Vapor Deposition

    Volume 17, Issue 4-6, June, 2011, Pages: 98–106, Delong He and Jinbo Bai

    Article first published online : 20 MAY 2011, DOI: 10.1002/cvde.201006878

  15. Uniformity, Structure, and Photocatalytic Activity of TiO2 Films Deposited by Atmospheric-Pressure Linear Cold Plasma

    Chemical Vapor Deposition

    Volume 18, Issue 10-12, December 2012, Pages: 309–314, Lan-Bo Di, Chuan Shi, Xiao-Song Li, Jing-Lin Liu and Ai-Min Zhu

    Article first published online : 19 NOV 2012, DOI: 10.1002/cvde.201207007

  16. Morphology and Growth Mechanism of Comb-like and Leaf-like ZnO Nanostructures

    Chemical Vapor Deposition

    Volume 18, Issue 7-9, September 2012, Pages: 182–184, Feng Shi and Chengshan Xue

    Article first published online : 19 JUL 2012, DOI: 10.1002/cvde.201204311

  17. Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon

    Chemical Vapor Deposition

    Volume 19, Issue 4-6, June 2013, Pages: 161–166, Berç Kalanyan, Mark D. Losego, Christopher J. Oldham and Gregory N. Parsons

    Article first published online : 31 MAY 2013, DOI: 10.1002/cvde.201307053

  18. Curauá Fiber Microimaging, Atomic Layer Deposition of Metal Oxide Films, and Obtaining of Nanowalled Microtubes

    Chemical Vapor Deposition

    Volume 17, Issue 1-3, March 2011, Pages: 58–64, Iryna Grafova, Marianna Kemell, Juliana N. Lunz, Maria de Fátima V. Marques, Andriy Grafov and Markku Leskelä

    Article first published online : 24 FEB 2011, DOI: 10.1002/cvde.201006886

  19. The Influence of H2O Content in Solvents {Water + Carbinol} and {Water + Ethanol} on the Deposition Mechanism of AZO Films Synthesized by Cold-wall AACVD

    Chemical Vapor Deposition

    Volume 18, Issue 7-9, September 2012, Pages: 256–262, Lin Zhao, Xiu Juan Qin, Guang Jie Shao and Na Wang

    Article first published online : 8 AUG 2012, DOI: 10.1002/cvde.201206981

  20. High Yield Preparation of Carbon Nanotube Arrays of Good Quality by CVD

    Chemical Vapor Deposition

    Volume 18, Issue 7-9, September 2012, Pages: 201–208, Shuxiu Shi, Hui Wang, Xitao Wang, Tao Xue, Weixin Hou, Lan Cui, Kui Lin, Fengmin Jin, Gang Cheng, Xiaoping Chen, Pei Yao and Shen Cui

    Article first published online : 19 JUL 2012, DOI: 10.1002/cvde.201106975