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There are 10130 results for: content related to: The Role of the Gas Phase in Graphene Formation by CVD on Copper

  1. Thermal- and Plasma-Enhanced Copper Film Deposition via a Combined Synthesis-Transport CVD Technique

    Chemical Vapor Deposition

    Volume 20, Issue 4-5-6, June 2014, Pages: 170–176, Maxim S. Polyakov, Aram M. Badalyan, Vasiliy V. Kaichev and Igor K. Igumenov

    Article first published online : 8 MAY 2014, DOI: 10.1002/cvde.201307078

  2. Combinatorial Atmospheric Pressure CVD of a Composite TiO2/SnO2 Thin Film

    Chemical Vapor Deposition

    Volume 20, Issue 1-2-3, March 2014, Pages: 69–79, Sanjayan Sathasivam, Andreas Kafizas, Sapna Ponja, Nicholas Chadwick, Davinder S. Bhachu, Salem M. Bawaked, Abdullah Y. Obaid, Shaeel Al-Thabaiti, Sulaiman N. Basahel, Claire J. Carmalt and Ivan P. Parkin

    Article first published online : 21 FEB 2014, DOI: 10.1002/cvde.201307081

  3. Design Strategies for Reduced-scale Surface Composition Gradients via CVD Copolymerization

    Chemical Vapor Deposition

    Volume 20, Issue 1-2-3, March 2014, Pages: 23–31, Yaseen Elkasabi, Aftin M. Ross, Jonathan Oh, Michael P. Hoepfner, H. Scott Fogler, Joerg Lahann and Paul H. Krebsbach

    Article first published online : 18 NOV 2013, DOI: 10.1002/cvde.201307057

  4. New Dimethyl(norbornadienyl)platinum(II) Precursors for Platinum MOCVD

    Chemical Vapor Deposition

    Volume 20, Issue 1-2-3, March 2014, Pages: 59–68, William Maudez, Christelle Roy, Phong Dinh Tran, Cyril Thurier, Farah Karmous and Pascal Doppelt

    Article first published online : 6 MAR 2014, DOI: 10.1002/cvde.201307084

  5. Characterization of Al2O3 Thin Films Fabricated at Low Temperature via Atomic Layer Deposition on PEN Substrates

    Chemical Vapor Deposition

    Volume 20, Issue 4-5-6, June 2014, Pages: 118–124, Kyung-Hyun Choi, Kamran Ali, Chang Young Kim and Nauman Malik Muhammad

    Article first published online : 21 FEB 2014, DOI: 10.1002/cvde.201307082

  6. Aluminizing of Nickel Alloys by CVD. The Effect of HCl Flow

    Chemical Vapor Deposition

    Volume 20, Issue 1-2-3, March 2014, Pages: 80–90, Bartek Wierzba, Katarzyna Tkacz-Śmiech, Andrzej Nowotnik and Kamil Dychtoń

    Article first published online : 21 FEB 2014, DOI: 10.1002/cvde.201307090

  7. Pulsed PECVD for Low-temperature Growth of Vertically Aligned Carbon Nanotubes

    Chemical Vapor Deposition

    Volume 20, Issue 4-5-6, June 2014, Pages: 161–169, Mahananda Baro, Dolly Gogoi, Arup Ratan Pal, Nirab Chandra Adhikary, Heremba Bailung and Joyanti Chutia

    Article first published online : 30 APR 2014, DOI: 10.1002/cvde.201307093

  8. Visible Light Photocatalytic Activity in AACVD-Prepared N-modified TiO2 Thin Films

    Chemical Vapor Deposition

    Volume 20, Issue 1-2-3, March 2014, Pages: 91–97, Veronica Diesen, Charles W. Dunnill, Joseph C. Bear, Steve Firth, Mats Jonsson and Ivan P. Parkin

    Article first published online : 21 FEB 2014, DOI: 10.1002/cvde.201307086

  9. MOCVD of TiO2 Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 224–233, Manish Banerjee, Van-Son Dang, Michal Bledowski, Radim Beranek, Hans-Werner Becker, Detlef Rogalla, Eugen Edengeiser, Martina Havenith, Andreas D. Wieck and Anjana Devi

    Article first published online : 25 JUL 2014, DOI: 10.1002/cvde.201407125

  10. Synthesis of Pt/SiO2 Catalyst Nanoparticles from a Continuous Aerosol Process using Novel Cyclo-octadienylplatinum Precursors

    Chemical Vapor Deposition

    Volume 19, Issue 7-8-9, September 2013, Pages: 274–283, Matthias Faust, Mirja Enders, Kun Gao, Linus Reichenbach, Thierry Muller, Wolfgang Gerlinger, Bernd Sachweh, Gerhard Kasper, Michael Bruns, Stefan Bräse and Martin Seipenbusch

    Article first published online : 12 AUG 2013, DOI: 10.1002/cvde.201207038

  11. Surface-immobilized Gold Nanoparticles by Organometallic CVD on Amine-terminated Glass Surfaces

    Chemical Vapor Deposition

    Volume 19, Issue 10-11-12, December 2013, Pages: 338–346, Erden Ertorer, Jessica C. Avery, Laura C. Pavelka and Silvia Mittler

    Article first published online : 6 NOV 2013, DOI: 10.1002/cvde.201307055

  12. tert-Butylethynyl-parylene and Phenylethynyl-parylene

    Chemical Vapor Deposition

    Volume 20, Issue 1-2-3, March 2014, Pages: 39–43, Jay J. Senkevich

    Article first published online : 31 OCT 2013, DOI: 10.1002/cvde.201307071

  13. Low-Temperature MOCVD of Crystalline Ga2O3 Nanowires using tBu3Ga

    Chemical Vapor Deposition

    Volume 19, Issue 10-11-12, December 2013, Pages: 347–354, Stephan Schulz, Georg Bendt, Wilfried Assenmacher, Daniel Sager and Gerd Bacher

    Article first published online : 6 NOV 2013, DOI: 10.1002/cvde.201307060

  14. The ALD-MLD Growth of a ZnO-Zincone Heterostructure

    Chemical Vapor Deposition

    Volume 20, Issue 4-5-6, June 2014, Pages: 130–137, Devika Choudhury and Shaibal K. Sarkar

    Article first published online : 24 FEB 2014, DOI: 10.1002/cvde.201307092

  15. Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light

    Chemical Vapor Deposition

    Volume 20, Issue 1-2-3, March 2014, Pages: 8–13, Zhi-Guang Sun, Xiao-Song Li, Xiaobing Zhu, Xiao-Qing Deng, Da-Lei Chang and Ai-Min Zhu

    Article first published online : 18 NOV 2013, DOI: 10.1002/cvde.201307088

  16. Improved Texturing and Photocatalytic Efficiency in TiO2 Films Grown Using Aerosol-Assisted CVD and Atmospheric Pressure CVD

    Chemical Vapor Deposition

    Volume 19, Issue 10-11-12, December 2013, Pages: 355–362, Veronica Diesen, Mats Jonsson and Ivan P. Parkin

    Article first published online : 11 NOV 2013, DOI: 10.1002/cvde.201307067

  17. CVD of Pt(C5H9)2 to Synthesize Highly Dispersed Pt/SBA-15 Catalysts for Hydrogenation of Chloronitrobenzene

    Chemical Vapor Deposition

    Volume 20, Issue 4-5-6, June 2014, Pages: 146–151, Manman Jiang, Mingming Zhang, Chuang Li, Christopher T. Williams and Changhai Liang

    Article first published online : 2 MAY 2014, DOI: 10.1002/cvde.201307091

  18. Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 189–208, Timothee Blanquart, Jaakko Niinistö, Mikko Ritala and Markku Leskelä

    Article first published online : 20 JUL 2014, DOI: 10.1002/cvde.201400055

  19. Reactive Mass Transport during the Aluminization of Rene-80

    Chemical Vapor Deposition

    Volume 19, Issue 7-8-9, September 2013, Pages: 267–273, Bartek Wierzba, Katarzyna Tkacz-Śmiech and Andrzej Nowotnik

    Article first published online : 7 AUG 2013, DOI: 10.1002/cvde.201307013

  20. Single-Source Precursor-Based Deposition of Sb2Te3 Films by MOCVD**

    Chemical Vapor Deposition

    Volume 19, Issue 7-8-9, September 2013, Pages: 235–241, Georg Bendt, Stephan Schulz, Sebastian Zastrow and Kornelius Nielsch

    Article first published online : 7 AUG 2013, DOI: 10.1002/cvde.201207044