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There are 32681 results for: content related to: Luminescent Properties of Multilayered Eu 2 O 3 and TiO 2 Grown by Atomic Layer Deposition**

  1. Focused Electron Beam-Induced CVD of Iron: a Practical Guide for Direct Writing

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 243–250, Marco Gavagnin, Heinz D. Wanzenboeck, Mostafa M. Shawrav, Domagoj Belic, Stefan Wachter, Simon Waid, Michael Stoeger–Pollach and Emmerich Bertagnolli

    Article first published online : 20 AUG 2014, DOI: 10.1002/cvde.201407118

  2. Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 209–216, Mikko Kaipio, Timothee Blanquart, Manish Banerjee, Ke Xu, Jaakko Niinistö, Valentino Longo, Kenichiro Mizohata, Anjana Devi, Mikko Ritala and Markku Leskelä

    Article first published online : 24 JUL 2014, DOI: 10.1002/cvde.201407115

  3. Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 217–223, Timothee Blanquart, Mikko Kaipio, Jaakko Niinistö, Marco Gavagnin, Valentino Longo, Laurie Blanquart, Clement Lansalot, W. Noh, Heinz D. Wanzenböck, Mikko Ritala and Markku Leskelä

    Article first published online : 20 JUL 2014, DOI: 10.1002/cvde.201407116

  4. Electron Beam-Induced CVD of Nanoalloys for Nanoelectronics

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 251–257, Mostafa Moonir Shawrav, Domagoj Belić, Marco Gavagnin, Stefan Wachter, Markus Schinnerl, Heinz D. Wanzenboeck and Emmerich Bertagnolli

    Article first published online : 19 AUG 2014, DOI: 10.1002/cvde.201407119

  5. Atomic Layer Deposition of LaPO4 and Ca:LaPO4**

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 269–273, Henrik Hovde Sønsteby, Erik Østreng, Helmer Fjellvåg and Ola Nilsen

    Article first published online : 25 JUL 2014, DOI: 10.1002/cvde.201407112

  6. MOCVD of TiO2 Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 224–233, Manish Banerjee, Van-Son Dang, Michal Bledowski, Radim Beranek, Hans-Werner Becker, Detlef Rogalla, Eugen Edengeiser, Martina Havenith, Andreas D. Wieck and Anjana Devi

    Article first published online : 25 JUL 2014, DOI: 10.1002/cvde.201407125

  7. Atomic Layer Deposition of TiOx/Al2O3 Bilayer Structures for Resistive Switching Memory Applications

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 282–290, Hehe Zhang, Nabeel Aslam, Marcel Reiners, Rainer Waser and Susanne Hoffmann-Eifert

    Article first published online : 28 JUL 2014, DOI: 10.1002/cvde.201407123

  8. Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 291–297, Trilok Singh, Shuangzhou Wang, Nabeel Aslam, Hehe Zhang, Susanne Hoffmann-Eifert and Sanjay Mathur

    Article first published online : 4 AUG 2014, DOI: 10.1002/cvde.201407122

  9. Surface Decoration of ϵ-Fe2O3 Nanorods by CuO Via a Two-Step CVD/Sputtering Approach**

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 313–319, Davide Barreca, Giorgio Carraro, Daniel Peeters, Alberto Gasparotto, Chiara Maccato, Wilhelmus M. M. Kessels, Valentino Longo, Francesca Rossi, Elza Bontempi, Cinzia Sada and Anjana Devi

    Article first published online : 22 JUL 2014, DOI: 10.1002/cvde.201407108

  10. Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO2 Films

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 320–327, Van-Son Dang, Manish Banerjee, Huaizhi Zhu, Nagendra Babu Srinivasan, Harish Parala, Janine Pfetzing-Micklich, Andreas D. Wieck and Anjana Devi

    Article first published online : 1 SEP 2014, DOI: 10.1002/cvde.201407124

  11. Roll-to-Roll Atmospheric Atomic Layer Deposition of Al2O3 Thin Films on PET Substrates

    Chemical Vapor Deposition

    Volume 20, Issue 10-11-12, December 2014, Pages: 380–387, Kamran Ali, Kyung-Hyun Choi and Nauman Malik Muhammad

    Article first published online : 13 OCT 2014, DOI: 10.1002/cvde.201407126

  12. Plasma-Assisted Atomic Layer Deposition of PtOx from (MeCp)PtMe3 and O2 Plasma

    Chemical Vapor Deposition

    Volume 20, Issue 7-8-9, September 2014, Pages: 258–268, Ivo J. M. Erkens, Marcel A. Verheijen, Harm C. M. Knoops, Tatiana F. Landaluce, Fred Roozeboom and Wilhelmus M. M. Kessels

    Article first published online : 6 AUG 2014, DOI: 10.1002/cvde.201407109

  13. Barrier Strain and Carbon Incorporation-Engineered Performance Improvements for AlGaN/GaN High Electron Mobility Transistors**

    Chemical Vapor Deposition

    Tien Tung Luong, Yen Teng Ho, Binh Tinh Tran, Yuen Yee Woong and Edward Yi Chang

    Article first published online : 18 DEC 2014, DOI: 10.1002/cvde.201407100

  14. Catalyst-free Growth Mechanism and Structure of Graphene-like Nanosheets Formed by Hot-Filament CVD

    Chemical Vapor Deposition

    Volume 20, Issue 10-11-12, December 2014, Pages: 345–351, Biben Wang, Kun Zheng, Qijin Cheng, Li Wang, Chengcheng Chen and Guobo Dong

    Article first published online : 30 JUN 2014, DOI: 10.1002/cvde.201407105

  15. Designing Non-uniform Wafer Micro-topography for Macroscopic Uniformity in Multi-scale CVD Processes

    Chemical Vapor Deposition

    Volume 20, Issue 10-11-12, December 2014, Pages: 364–372, Nikolaos Kallikounis, George Kokkoris, Nikolaos Cheimarios and Andreas G. Boudouvis

    Article first published online : 13 OCT 2014, DOI: 10.1002/cvde.201407087

  16. Coating of Alumina Fibres With Aluminium Phosphate by a Continuous Chemical Vapour Deposition Process

    Chemical Vapor Deposition

    Volume 20, Issue 10-11-12, December 2014, Pages: 388–398, Sabine Stöckel, Susann Ebert, Maike Böttcher, Andreas Seifert, Thomas Wamser, Walter Krenkel, Steffen Schulze, Michael Hietschold, Helmut Gnaegi and Werner A. Goedel

    Article first published online : 20 OCT 2014, DOI: 10.1002/cvde.201407099

  17. Growth and Properties of Amorphous Erbium-doped Aluminum-yttrium Oxide Films Deposited by Aerosol-UV-Assisted MOCVD

    Chemical Vapor Deposition

    Rached Salhi, Carmen Jimenez, Jean-Luc Deschanvres, Ramzi Maâlej and Mohieddine Fourati

    Article first published online : 24 NOV 2014, DOI: 10.1002/cvde.201407068

  18. Initiated CVD of Tertiary Amine-Containing Glycidyl Methacrylate Copolymer Thin Films for Low Temperature Aqueous Chemical Functionalization

    Chemical Vapor Deposition

    Volume 20, Issue 10-11-12, December 2014, Pages: 373–379, Fatma Sarıipek and Mustafa Karaman

    Article first published online : 24 OCT 2014, DOI: 10.1002/cvde.201407129

  19. Highly Photocatalytically Active Iron(III) Titanium Oxide Thin films via Aerosol-Assisted CVD

    Chemical Vapor Deposition

    Sanjayan Sathasivam, Davinder S. Bhachu, Yao Lu, Salem M. Bawaked, Abdullah Y. Obaid, Shaeel Al-Thabaiti, Sulaiman N. Basahel, Claire J. Carmalt and Ivan P. Parkin

    Article first published online : 20 NOV 2014, DOI: 10.1002/cvde.201407143

  20. Full CVD Reel-To-Reel Process to Obtain Perfectly Oriented Silicon Films on Metal Tapes with Oxide Buffer Layers**

    Chemical Vapor Deposition

    Volume 20, Issue 10-11-12, December 2014, Pages: 356–363, Mikhail Moyzykh, Sergey Samoilenkov, Vadim Amelichev, Alexander Vasiliev, Mikhail Pozdnyakov, Alexey Mankevich, Vsevolod Tschepikov and Andrey Kaul

    Article first published online : 25 JUL 2014, DOI: 10.1002/cvde.201407107