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There are 6966 results for: content related to: Synthesis of dual-functional copolymer with orthogonally photosensitive groups

  1. Photolithography

    Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

    Rainer Leuschner, Georg Pawlowski, Pages: 177–263, 2008

    Published Online : 28 MAY 2008, DOI: 10.1002/9783527621828.ch4

  2. Photolithography

    Handbook of Semiconductor Technology Set

    Rainer Leuschner, Georg Pawlowski, Pages: 177–263, 2008

    Published Online : 4 JUN 2008, DOI: 10.1002/9783527619290.ch4a

  3. Preparation of a Photoacid Generating Monomer and Its Application in Lithography

    Advanced Functional Materials

    Volume 11, Issue 4, August, 2001, Pages: 271–276, H. Wu and K. E. Gonsalves

    Version of Record online : 6 AUG 2001, DOI: 10.1002/1616-3028(200108)11:4<271::AID-ADFM271>3.0.CO;2-Q

  4. Photolithography

    Standard Article

    Materials Science and Technology

    Rainer Leuschner and Georg Pawlowski

    Published Online : 15 FEB 2013, DOI: 10.1002/9783527603978.mst0258

  5. Photochemical Doping and Tuning of the Work Function and Dirac Point in Graphene Using Photoacid and Photobase Generators

    Advanced Functional Materials

    Volume 24, Issue 32, August 27, 2014, Pages: 5147–5156, Jose Baltazar, Hossein Sojoudi, Sergio A. Paniagua, Siyuan Zhang, Richard A. Lawson, Seth R. Marder, Samuel Graham, Laren M. Tolbert and Clifford L. Henderson

    Version of Record online : 4 JUN 2014, DOI: 10.1002/adfm.201303796

  6. Photoresist Latent and Developer Images as Probed by Neutron Reflectivity Methods

    Advanced Materials

    Volume 23, Issue 3, January 18, 2011, Pages: 388–408, Vivek M. Prabhu, Shuhui Kang, David L. VanderHart, Sushil K. Satija, Eric K. Lin and Wen-li Wu

    Version of Record online : 16 SEP 2010, DOI: 10.1002/adma.201001762

  7. Direct Patterning for Active Polymers

    Functional Polymer Films: 2 Volume Set

    Eunkyoung Kim, Jungmok You, Yuna Kim, Jeonghun Kim, Pages: 519–569, 2011

    Published Online : 7 JUN 2011, DOI: 10.1002/9783527638482.ch15

  8. Ultraviolet-Light-Induced Reversible and Stable Carrier Modulation in MoS2 Field-Effect Transistors

    Advanced Functional Materials

    Volume 24, Issue 45, December 3, 2014, Pages: 7125–7132, Arun Kumar Singh, Shaista Andleeb, Jai Singh, Hoang Tien Dung, Yongho Seo and Jonghwa Eom

    Version of Record online : 12 SEP 2014, DOI: 10.1002/adfm.201402231

  9. Polymerization of N-(tert-butyldimethylsilyloxy)maleimide and applications of the polymers as resist materials

    Journal of Applied Polymer Science

    Volume 66, Issue 13, 26 December 1997, Pages: 2507–2516, Sang-Tae Kim, Jin-Baek Kim, Chan-Moon Chung and Kwang-Duk Ahn

    Version of Record online : 7 DEC 1998, DOI: 10.1002/(SICI)1097-4628(19971226)66:13<2507::AID-APP13>3.0.CO;2-U

  10. A new single grating spectrograph for ultraviolet Raman scattering studies

    Journal of Raman Spectroscopy

    Volume 37, Issue 5, May 2006, Pages: 562–573, Lutz Hecht, John Clarkson, Brian J. E. Smith and Roger Springett

    Version of Record online : 22 NOV 2005, DOI: 10.1002/jrs.1432

  11. Preparation and use of a mesoporous silicate material for the removal of tetramethyl ammonium hydroxide (TMAH) from aqueous solution

    Journal of Chemical Technology and Biotechnology

    Volume 76, Issue 12, December 2001, Pages: 1216–1222, Brian P Kelleher, Aidan M Doyle, Thomas F O'Dwyer and Benjamin K Hodnett

    Version of Record online : 9 OCT 2001, DOI: 10.1002/jctb.508

  12. Photolithography Materials

    Standard Article

    Handbook of Chemicals and Gases for the Semiconductor Industry

    Ashutosh Misra, Jeremiah D. Hogan and Russell Chorush

    Published Online : 15 JUL 2002, DOI: 10.1002/0471263850.mis045

  13. Highly-uniform 260 nm-band AlGaN-based deep-ultraviolet light-emitting diodes developed by 2-inch×3 MOVPE system

    physica status solidi (c)

    Volume 9, Issue 3-4, March 2012, Pages: 749–752, Takuya Mino, Hideki Hirayama, Takayoshi Takano, Norimichi Noguchi and Kenji Tsubaki

    Version of Record online : 7 DEC 2011, DOI: 10.1002/pssc.201100358

  14. Polymeric silicon-containing resist materials

    Advanced Materials for Optics and Electronics

    Volume 4, Issue 2, March/April 1994, Pages: 95–127, R. D. Miller and G. M. Wallraff

    Version of Record online : 14 SEP 2004, DOI: 10.1002/amo.860040206

  15. Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography

    Advanced Materials

    Volume 12, Issue 15, August, 2000, Pages: 1118–1122, D. C. Tully, A. R. Trimble and J. M. J. Fréchet

    Version of Record online : 28 JUL 2000, DOI: 10.1002/1521-4095(200008)12:15<1118::AID-ADMA1118>3.0.CO;2-I

  16. Photoacid generating polymers based on sulfonyloxymaleimides and application as single-component resists

    Journal of Polymer Science Part A: Polymer Chemistry

    Volume 34, Issue 2, 30 January 1996, Pages: 183–191, Kwang-Duk Ahn, Jae-Sun Koo and Chan-Moon Chung

    Version of Record online : 21 JAN 2000, DOI: 10.1002/(SICI)1099-0518(19960130)34:2<183::AID-POLA4>3.0.CO;2-V

  17. Deep-UV tip-enhanced Raman scattering

    Journal of Raman Spectroscopy

    Volume 40, Issue 9, September 2009, Pages: 1324–1330, Atsushi Taguchi, Norihiko Hayazawa, Kentaro Furusawa, Hidekazu Ishitobi and Satoshi Kawata

    Version of Record online : 17 APR 2009, DOI: 10.1002/jrs.2287

  18. Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains

    Advanced Materials

    Volume 13, Issue 9, May, 2001, Pages: 670–672, H. Wu and K. E. Gonsalves

    Version of Record online : 2 MAY 2001, DOI: 10.1002/1521-4095(200105)13:9<670::AID-ADMA670>3.0.CO;2-3

  19. Closer to Nature–Bio-inspired Patterns by Transforming Latent Lithographic Images

    Advanced Materials

    Volume 23, Issue 42, November 9, 2011, Pages: 4873–4879, Stefan Giselbrecht, Martina Reinhardt, Timo Mappes, Martin Börner, Eric Gottwald, Clemens van Blitterswijk, Volker Saile and Roman Truckenmüller

    Version of Record online : 21 SEP 2011, DOI: 10.1002/adma.201102759

  20. Synthesis of a highly transparent poly(o-hydroxyamide) in the i-line region and its application to photosensitive polymers

    Journal of Polymer Science Part A: Polymer Chemistry

    Volume 43, Issue 12, 15 June 2005, Pages: 2527–2535, Fumihiro Toyokawa, Ken-Ichi Fukukawa, Yuji Shibasaki, Shinji Ando and Mitsuru Ueda

    Version of Record online : 6 MAY 2005, DOI: 10.1002/pola.20729