Search Results

There are 22824 results for: content related to: Preparation and characterization of tantalum oxide films produced by reactive DC magnetron sputtering

  1. Characterization of Niobium Oxide Films Prepared by Reactive DC Magnetron Sputtering

    physica status solidi (a)

    Volume 188, Issue 3, December 2001, Pages: 1047–1058, S. Venkataraj, R. Drese, O. Kappertz, R. Jayavel and M. Wuttig

    Version of Record online : 29 NOV 2001, DOI: 10.1002/1521-396X(200112)188:3<1047::AID-PSSA1047>3.0.CO;2-J

  2. The effect of oxygen flow rates on magnetic and high-frequency characteristics of Fe-Hf-O films

    physica status solidi (a)

    Volume 209, Issue 4, April 2012, Pages: 773–776, Zong-Shenq Wang, Yuan-Tai Lai and Jenq-Gong Duh

    Version of Record online : 7 FEB 2012, DOI: 10.1002/pssa.201127500

  3. Transparent and conductive indium tin oxide/polyimide films prepared by high-temperature radio-frequency magnetron sputtering

    Journal of Applied Polymer Science

    Volume 132, Issue 44, November 20, 2015, Yu Wen, Huan Liu, Shiyong Yang and Lin Fan

    Version of Record online : 6 AUG 2015, DOI: 10.1002/app.42753

  4. The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure

    Plasma Processes and Polymers

    Volume 9, Issue 11-12, December 2012, Pages: 1116–1124, Rüdiger Reuter, Katja Rügner, Dirk Ellerweg, Teresa de los Arcos, Achim von Keudell and Jan Benedikt

    Version of Record online : 5 JAN 2012, DOI: 10.1002/ppap.201100146

  5. Properties of TiOx coatings prepared by dc magnetron sputtering

    physica status solidi (a)

    Volume 198, Issue 1, July 2003, Pages: 224–237, S. H. Mohamed, O. Kappertz, T. P. Leervad Pedersen, R. Drese and M. Wuttig

    Version of Record online : 24 JUN 2003, DOI: 10.1002/pssa.200306597

  6. Plasma Polymerization of Organovanadium Oxides onto Flexible PET/ITO Substrates for Flexible Electrochromic Devices

    Plasma Processes and Polymers

    Volume 5, Issue 5, July 18, 2008, Pages: 471–481, Yung-Sen Lin and Ching-Lun Chen

    Version of Record online : 14 MAY 2008, DOI: 10.1002/ppap.200700144

  7. Influence of the Gas Phase on the Water Vapor Barrier Properties of SiOx Films Deposited from RF and Dual-Mode Plasmas

    Plasma Processes and Polymers

    Volume 3, Issue 8, October 11, 2006, Pages: 606–617, Axel Sonnenfeld, Andrea Bieder and Philipp Rudolf von Rohr

    Version of Record online : 29 SEP 2006, DOI: 10.1002/ppap.200500159

  8. Optimization of DC Reactive Magnetron Sputtering Deposition Process for Efficient YSZ Electrolyte Thin Film SOFC

    Fuel Cells

    Volume 13, Issue 2, April, 2013, Pages: 279–288, H. Hidalgo, A.-L. Thomann, T. Lecas, J. Vulliet, K. Wittmann-Teneze, D. Damiani, E. Millon and P. Brault

    Version of Record online : 28 NOV 2012, DOI: 10.1002/fuce.201200125

  9. DC-sputtered ZnO:Al as transparent conductive oxide for silicon heterojunction solar cells with µc-Si:H emitter

    Progress in Photovoltaics: Research and Applications

    Volume 23, Issue 10, October 2015, Pages: 1340–1352, Omid Madani Ghahfarokhi, Kambulakwao Chakanga, Stefan Geissendoerfer, Oleg Sergeev, Karsten von Maydell and Carsten Agert

    Version of Record online : 6 DEC 2014, DOI: 10.1002/pip.2570

  10. Wear Resistance of Low-Temperature Plasma-Polymerized Organosilica Deposited on Poly(ethylene terephthalate): The Effect of O2 Addition

    Plasma Processes and Polymers

    Volume 3, Issue 9, November 17, 2006, Pages: 650–660, Yung-Sen Lin and Ching-Lun Chen

    Version of Record online : 13 NOV 2006, DOI: 10.1002/ppap.200600034

  11. Optical and Electrical Properties of W-O-N Coatings Deposited by DC Reactive Sputtering

    Plasma Processes and Polymers

    Volume 4, Issue S1, April 2007, Pages: S69–S75, Nuno M. G. Parreira, Tomas Polcar, Nicolas Martin, Oksana Banakh and Albano Cavaleiro

    Version of Record online : 24 APR 2007, DOI: 10.1002/ppap.200730405

  12. Correlation Between Processing and Properties of Titanium Oxycarbide, TiCxOy, Thin Films

    Plasma Processes and Polymers

    Volume 4, Issue S1, April 2007, Pages: S83–S88, Ana C. Fernandes, Pedro Carvalho, Filipe Vaz, Nuno M. G. Parreira, Philippe Goudeau, Eric Le Bourhis and Jean-Paul Rivière

    Version of Record online : 24 APR 2007, DOI: 10.1002/ppap.200730407

  13. You have free access to this content
    Binary copper oxide semiconductors: From materials towards devices

    physica status solidi (b)

    Volume 249, Issue 8, August 2012, Pages: 1487–1509, B. K. Meyer, A. Polity, D. Reppin, M. Becker, P. Hering, P. J. Klar, Th. Sander, C. Reindl, J. Benz, M. Eickhoff, C. Heiliger, M. Heinemann, J. Bläsing, A. Krost, S. Shokovets, C. Müller and C. Ronning

    Version of Record online : 6 JUN 2012, DOI: 10.1002/pssb.201248128

  14. Effects of Processing Parameters in the MOCVD Growth of Nanostructured Lanthanum Trifluoride and Oxyfluoride Thin Films

    Chemical Vapor Deposition

    Volume 12, Issue 12, December, 2006, Pages: 736–741, G. Malandrino, L. M. S. Perdicaro and I. L. Fragalà

    Version of Record online : 12 DEC 2006, DOI: 10.1002/cvde.200606504

  15. Study of the Stability and Hydrophilicity of Plasma-Modified Microfluidic Materials

    Plasma Processes and Polymers

    Volume 14, Issue 3, March 2017, Bradley Da Silva, Mengxue Zhang, Guillaume Schelcher, Lea Winter, Cédric Guyon, Patrick Tabeling, Daniel Bonn and Michael Tatoulian

    Version of Record online : 4 OCT 2016, DOI: 10.1002/ppap.201600034

  16. Deposition of a TMDSO-Based Film by a Non-Equilibrium Atmospheric Pressure DC Plasma Jet

    Plasma Processes and Polymers

    Volume 10, Issue 7, July 2013, Pages: 641–648, Xiaolong Deng, Anton Yu Nikiforov, Nathalie De Geyter, Rino Morent and Christophe Leys

    Version of Record online : 8 APR 2013, DOI: 10.1002/ppap.201200166

  17. Deposition of thin films by sputtering cold isostatically pressed powder targets: A case study

    physica status solidi (a)

    Volume 209, Issue 3, March 2012, Pages: 524–530, Francis Boydens, Wouter Leroy, Rosita Persoons and Diederik Depla

    Version of Record online : 9 DEC 2011, DOI: 10.1002/pssa.201127490

  18. You have free access to this content
    The Laerdal pocket mask: effects of increasing supplementary oxygen flow

    Anaesthesia

    Volume 47, Issue 11, November 1992, Pages: 967–971, A. N. Thomas, J. Hyatt, J. L. Chen and S. J. Barker

    Version of Record online : 22 FEB 2007, DOI: 10.1111/j.1365-2044.1992.tb03201.x

  19. Simultaneous Etching and Deposition Processes during the Etching of Silicon with a Cl2/O2/Ar Inductively Coupled Plasma

    Plasma Processes and Polymers

    Volume 8, Issue 6, June 22, 2011, Pages: 490–499, Stefan Tinck, Annemie Bogaerts and Denis Shamiryan

    Version of Record online : 29 MAR 2011, DOI: 10.1002/ppap.201000189

  20. Study of the Cathode Potential in a Sputtering Discharge by Pulsing the Reactive Gas: Case of a W Target in an Ar-O2 Atmosphere

    Plasma Processes and Polymers

    Volume 4, Issue 1, January 5, 2007, Pages: 62–68, Nuno M.G. Parreira, Tomáš Polcar and Albano Cavaleiro

    Version of Record online : 22 JAN 2007, DOI: 10.1002/ppap.200600050