Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V: Results of a CCQM pilot studySurface and Interface Analysis
Volume 36, Issue 9, September 2004, Pages: 1269–1303, M. P. Seah, S. J. Spencer, F. Bensebaa, I. Vickridge, H. Danzebrink, M. Krumrey, T. Gross, W. Oesterle, E. Wendler, B. Rheinländer, Y. Azuma, I. Kojima, N. Suzuki, M. Suzuki, S. Tanuma, D. W. Moon, H. J. Lee, Hyun Mo Cho, H. Y. Chen, A. T. S. Wee, T. Osipowicz, J. S. Pan, W. A. Jordaan, R. Hauert, U. Klotz, C. van der Marel, M. Verheijen, Y. Tamminga, C. Jeynes, P. Bailey, S. Biswas, U. Falke, N. V. Nguyen, D. Chandler-Horowitz, J. R. Ehrstein, D. Muller and J. A. Dura
Article first published online : 1 SEP 2004, DOI: 10.1002/sia.1909