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There are 8584875 results for: content related to: Growth and characterization of thin Si–C films in RF plasma and optical emission spectroscopy

  1. EPR and TSCR investigations of implanted Al[BOND]SiO2[BOND]Si systems treated with RF plasma discharge

    physica status solidi (a)

    Volume 113, Issue 2, 16 June 1989, Pages: 653–665, V. S. Lysenko, A. N. Nazarov, S. A. Valiev, I. M. Zaritskii, T. E. Rudenko and A. S. Tkachenko

    Version of Record online : 16 FEB 2006, DOI: 10.1002/pssa.2211130248

  2. Electron and Negative Ion Analysis in Oxygen Capacitively Coupled Radio Frequency Plasma

    Contributions to Plasma Physics

    Volume 52, Issue 7, August 2012, Pages: 561–570, J. Meichsner, K. Dittmann and C. Küllig

    Version of Record online : 16 AUG 2012, DOI: 10.1002/ctpp.201210052

  3. Ga doped ZnO thin films prepared by RF plasma assisted DC magnetron sputtering under reductive atmosphere without heating substrates

    physica status solidi (c)

    Volume 7, Issue 6, June 2010, Pages: 1559–1561, Toshio Hinoki, Kenji Yazawa, Kentaro Kinoshita, Koutoku Ohmi and Satoru Kishida

    Version of Record online : 1 APR 2010, DOI: 10.1002/pssc.200983226

  4. Main Features of the Electron Kinetics in Collision Dominated Steady-State rf Plasmas

    Annalen der Physik

    Volume 497, Issue 4-6, 1985, Pages: 537–558, Dr. sc. R. Winkler, Prof. Dr. J. Wilhelm and A. Hess

    Version of Record online : 14 MAR 2006, DOI: 10.1002/andp.19854970421

  5. Tribological Properties and Characterization of Diamond Like Carbon Coatings Deposited by MW/RF and RF Plasma-Enhanced CVD Method on Poly(ether-ether-ketone)

    Plasma Processes and Polymers

    Volume 11, Issue 9, September 2014, Pages: 878–887, Witold Kaczorowski, Witold Szymanski, Damian Batory and Piotr Niedzielski

    Version of Record online : 2 JUL 2014, DOI: 10.1002/ppap.201400025

  6. Bulk, Ablative, and Side Reactions

    The Plasma Chemistry of Polymer Surfaces: Advanced Techniques for Surface Design

    Jörg Friedrich, Pages: 145–195, 2012

    Published Online : 17 APR 2012, DOI: 10.1002/9783527648009.ch6

  7. PTFE Surface Etching in the Post-discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species

    Plasma Processes and Polymers

    Volume 9, Issue 8, August 2012, Pages: 820–829, Thierry Dufour, Julie Hubert, Pascal Viville, Corinne Y. Duluard, Simon Desbief, Roberto Lazzaroni and François Reniers

    Version of Record online : 30 MAY 2012, DOI: 10.1002/ppap.201100209

  8. Hydrogen in Monocrystalline CVD Boron Doped Diamond

    physica status solidi (a)

    Volume 174, Issue 1, July 1999, Pages: 73–81, J. Chevallier, D. Ballutaud, B. Theys, F. Jomard, A. Deneuville, E. Gheeraert and F. Pruvost

    Version of Record online : 22 JUL 1999, DOI: 10.1002/(SICI)1521-396X(199907)174:1<73::AID-PSSA73>3.0.CO;2-5

  9. Dependence of plasma treatment of ITO electrode films on electrical and optical properties of polymer light-emitting diodes

    physica status solidi (a)

    Volume 209, Issue 11, November 2012, Pages: 2317–2323, Seung Ho Kim, Seung Jun Baek, Young Chul Chang and Ho Jung Chang

    Version of Record online : 7 AUG 2012, DOI: 10.1002/pssa.201228116

  10. Surface characterization of low-temperature cascade arc plasma–treated low-density polyethylene using contact angle measurements

    Journal of Applied Polymer Science

    Volume 99, Issue 5, 5 March 2006, Pages: 2528–2541, M. A. Gilliam and Q. S. Yu

    Version of Record online : 28 DEC 2005, DOI: 10.1002/app.22848

  11. Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning

    Journal of Synchrotron Radiation

    Volume 21, Issue 2, March 2014, Pages: 300–314, Eric Pellegrin, Igors Šics, Juan Reyes-Herrera, Carlos Perez Sempere, Juan Josep Lopez Alcolea, Michel Langlois, Jose Fernandez Rodriguez and Vincent Carlino

    DOI: 10.1107/S1600577513032402

  12. Mechanical stress in silicon oxides grown on hydrogen implanted Si

    physica status solidi (c)

    Volume 9, Issue 10-11, October 2012, Pages: 2203–2206, Sashka Alexandrova, Anna Szekeres and Evgenia Valcheva

    Version of Record online : 19 SEP 2012, DOI: 10.1002/pssc.201200235

  13. Dynamics and Electronegativity of Oxygen RF Plasmas

    Contributions to Plasma Physics

    Volume 52, Issue 10, November 2012, Pages: 836–846, C. Küllig, K. Dittmann, T. Wegner, I. Sheykin, K. Matyash, D. Loffhagen, R. Schneider and J. Meichsner

    Version of Record online : 9 NOV 2012, DOI: 10.1002/ctpp.201200048

  14. Surface modification and characterization of an H2/O2 plasma-treated polypropylene membrane

    Journal of Applied Polymer Science

    Volume 124, Issue S1, 25 June 2012, Pages: E108–E115, Chun Huang, Ching-Yuan Tsai and Ruey-Shin Juang

    Version of Record online : 14 DEC 2011, DOI: 10.1002/app.34049

  15. RF plasma annealing of implanted MIS structures

    physica status solidi (a)

    Volume 88, Issue 2, 16 April 1985, Pages: 705–712, V. S. Lysenko, M. M. Lokshin, A. N. Nazarov and T. E. Rudenko

    Version of Record online : 17 FEB 2006, DOI: 10.1002/pssa.2210880238

  16. Plasma-Assisted Synthesis and Surface Modification of Electrode Materials for Renewable Energy

    Advanced Materials

    Shuo Dou, Li Tao, Ruilun Wang, Samir El Hankari, Ru Chen and Shuangyin Wang

    Version of Record online : 14 FEB 2018, DOI: 10.1002/adma.201705850

  17. Reduction of permanent image sticking in ACPDPs using RF-plasma pretreatment on MgO surface

    Journal of the Society for Information Display

    Volume 18, Issue 8, August 2010, Pages: 606–613, Choon-Sang Park, Jae Hyun Kim, Soo-Kwan Jang, Heung-Sik Tae and Eun-Young Jung

    Version of Record online : 18 JUN 2012, DOI: 10.1889/JSID18.8.606

  18. Electrical characterization of MIS structures with HfOx gate dielectric films fabricated on silicon substrates modified by ultra-shallow ion implantation from RF plasma

    physica status solidi (c)

    Volume 13, Issue 10-12, December 2016, Pages: 816–821, Robert Mroczyński, Małgorzata Kalisz and Magdalena Dominik

    Version of Record online : 19 JUL 2016, DOI: 10.1002/pssc.201600061

  19. Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition

    physica status solidi (c)

    Volume 9, Issue 3-4, March 2012, Pages: 1053–1056, E. Cappelli, D. M. Trucchi, S. Orlando, A. Bellucci, A. Mezzi and S. Kaciulis

    Version of Record online : 14 FEB 2012, DOI: 10.1002/pssc.201100105

  20. Self-Cleaning Textiles Modified by TiO2 and Bactericide Textiles Modified by Ag and Cu

    Self-Cleaning Materials and Surfaces: A Nanotechnology Approach

    John Kiwi, Cesar Pulgarin, Pages: 203–227, 2013

    Published Online : 19 JUL 2013, DOI: 10.1002/9781118652336.ch7