Encyclopedia of Polymer Science and Technology

Copyright © 1999-2014 by John Wiley and Sons, Inc. All Rights Reserved.

Encyclopedia of Polymer Science and Technology

Online ISBN: 9780471440260

DOI: 10.1002/0471440264

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Lithographic resists

The resolution of photolithographic process, primarily limited by the radiation wavelength λ, can be increased via double patterning. Read the article Lithographic Resists to find out more about double patterning and its limitations, polymer-based coating, and photochemistry.


In September 2012, the following new or revised articles were posted:

 

Isodesmic vs. cooperative polymerization

Supramolecular polymerizations can follow an isodesmic mechanism (top: monomer binding constant K does not vary with the degree of polymerization) or cooperative (bottom: the binding constant in the nucleation and elongation stages do not vary with the degree of polymerization, however their values are different, Kn≠Ke). To find out how to distinguish between these two mechanisms of polymerization read the article on Supramolecular Polymers.


In August 2012, the following new or revised articles were posted:

 

Micelles and vesicles

Block-copolymers form micellar (left) and vesicular (right) morphologies by tuning the ratio of their hydrophilic (red) to hydrophobic (gray) parts. See the articles Polymeric Micelles and Polymer Vesicles for an overview of the techniques to template polymer-based nanoscale morphologies and their applications.


In March 2012, the following new or revised articles were posted:


In February 2012, the following new or revised articles were posted:


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In 2011 the following new or revised articles were posted:

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