Dielectric Films for Advanced Microelectronics

Dielectric Films for Advanced Microelectronics

Editor(s): Mikhail R. Baklanov, Martin L. Green, Karen Maex

Published Online: 19 MAR 2007

Print ISBN: 9780470013601

Online ISBN: 9780470017944

DOI: 10.1002/9780470017944

Series Editor(s): Peter Capper, Safa Kasap, Arthur Willoughby

About this Book

The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials.

This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.

Table of contents

    1. You have free access to this content
    2. Chapter 2

      Spin-on Dielectric Materials (pages 33–83)

      Geraud Dubois, Robert D. Miller and Willi Volksen

    3. Chapter 3

      Porosity of Low Dielectric Constant Materials (pages 85–136)

      David W. Gidley, Hua-Gen Peng, Richard Vallery, Christopher L. Soles, Hae-Jeong Lee, Bryan D. Vogt, Eric K. Lin, Wen-Li Wu and Mikhail R. Baklanov

    4. Chapter 4

      Mechanical and Transport Properties of Low-k Dielectrics (pages 137–197)

      J.L. Plawsky, R. Achanta, W. Cho, O. Rodriguez, R. Saxena and W.N. Gill

    5. Chapter 5

      Integration of Low-k Dielectric Films in Damascene Processes (pages 199–250)

      R.J.O.M. Hoofman, V.H. Nguyen, V. Arnal, M. Broekaart, L.G. Gosset, W.F.A. Besling, M. Fayolle and F. Iacopi

    6. Chapter 9

      Electrical Characterization of Advanced Gate Dielectrics (pages 371–435)

      Robin Degraeve, Jurriaan Schmitz, Luigi Pantisano, Eddy Simoen, Michel Houssa, Ben Kaczer and Guido Groeseneken

    7. You have free access to this content