Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production

Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production

Editor(s): Hans J. Scheel, Peter Capper

Published Online: 25 NOV 2008

Print ISBN: 9783527317622

Online ISBN: 9783527623440

DOI: 10.1002/9783527623440

About this Book

In this book top experts treat general thermodynamic aspects of crystal fabrication; numerical simulation of industrial growth processes; commercial production of bulk silicon, compound semiconductors, scintillation and oxide crystals; X-ray characterization; and crystal machining. Also, the role of crystal technology for renewable energy and for saving energy is discussed. It will be useful for scientists and engineers involved in crystal and epilayer fabrication as well as for teachers and graduate students in material science, chemical and metallurgical engineering, and micro- and optoelectronics, including nanotechnology.

Table of contents

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  1. Part I: General Aspects of Crystal Growth Technology

    1. Chapter 4

      Thermophysical Properties of Molten Silicon (pages 103–136)

      Taketoshi Hibiya, Hiroyuki Fukuyama, Takao Tsukada and Masahito Watanabe

  2. Part II: Simulation of Industrial Growth Processes

    1. Chapter 8

      Modeling of Semitransparent Bulk Crystal Growth (pages 205–228)

      Vladimir Kalaev, Yuri Makarov, Valentin Yuferev and Alexander Zhmakin

  3. Part III: Compound Semiconductors

    1. Chapter 9

      Recent Progress in GaAs Growth Technologies at FREIBERGER (pages 230–266)

      Stefan Eichler, Frank Börner, Thomas Bünger, Manfred Jurisch, Andreas Köhler, Ullrich Kretzer, Max Scheffer-Czygan, Berndt Weinert and Tilo Flade

    2. Chapter 13

      X-Ray Diffraction Imaging of Industrial Crystals (pages 337–350)

      Keith Bowen, David Jacques, Petra Feichtinger and Matthew Wormington

  4. Part IV: Scintillator Crystals

  5. Part V: Oxides

  6. Part VII: Crystal Machining

    1. Chapter 19

      Plasma Chemical Vaporization Machining and Elastic Emission Machining (pages 475–495)

      Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi and Yuzo Mori

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