Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production

Copyright © 2008 Wiley-VCH Verlag GmbH & Co. KGaA

Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production

Editor(s): Hans J. Scheel, Peter Capper

Published Online: 25 NOV 2008

Print ISBN: 9783527317622

Online ISBN: 9783527623440

DOI: 10.1002/9783527623440

About this Book

Product Information

About The Product

Capturing the essence of current trends, markets, design tools and technologies in this key field, the internationally acclaimed expert editors have put together a handy reference tailor-made for readers facing the threshold challenges between research and industrial applications.
Following a look at general aspects, the book goes on to discuss simulation of industrial growth processes, compound semiconductors, scintillator crystals, oxides, and crystal machining, as well as the potential of crystal growth for sustaining energy and aspects of world crystal production.
With many figures, tables and schemes, this book is a must-have for industrial and research chemists, physicists and engineers.

Table of contents

    1. You have free access to this content
      Front Matter (pages I–XVI)

  2. Part I: General Aspects of Crystal Growth Technology

    1. Chapter 1

      Phase Diagrams for Crystal Growth (pages 2–26)

      Manfred Mühlberg

    2. Chapter 2

      Fundamentals of Equilibrium Thermodynamics of Crystal Growth (pages 27–72)

      Klaus Jacobs

    3. Chapter 3

      Thermodynamics, Origin, and Control of Defects (pages 73–101)

      Peter Rudolph

    4. Chapter 4

      Thermophysical Properties of Molten Silicon (pages 103–136)

      Taketoshi Hibiya, Hiroyuki Fukuyama, Takao Tsukada and Masahito Watanabe

  3. Part II: Simulation of Industrial Growth Processes

    1. Chapter 5

      Yield Improvement and Defect Control in Bridgman-Type Crystal Growth with the Aid of Thermal Modeling (pages 138–172)

      Jochen Friedrich

    2. Chapter 6

      Modeling of Czochralski Growth of Large Silicon Crystals (pages 173–194)

      Vladimir Kalaev, Yuri Makarov and Alexander Zhmakin

    3. Chapter 7

      Global Analysis of Effects of Magnetic Field Configuration on Melt/Crystal Interface Shape and Melt Flow in a Cz-Si Crystal Growth (pages 195–204)

      Koichi Kakimoto and Lijun Liu

    4. Chapter 8

      Modeling of Semitransparent Bulk Crystal Growth (pages 205–228)

      Vladimir Kalaev, Yuri Makarov, Valentin Yuferev and Alexander Zhmakin

  4. Part III: Compound Semiconductors

    1. Chapter 9

      Recent Progress in GaAs Growth Technologies at FREIBERGER (pages 230–266)

      Stefan Eichler, Frank Börner, Thomas Bünger, Manfred Jurisch, Andreas Köhler, Ullrich Kretzer, Max Scheffer-Czygan, Berndt Weinert and Tilo Flade

    2. Chapter 10

      Interface Stability and Its Impact on Control Dynamics (pages 267–281)

      Frank J. Bruni

    3. Chapter 11

      Use of Forced Mixing via the Accelerated Crucible Rotation Technique (ACRT) in Bridgman Growth of Cadmium Mercury Telluride (CMT) (pages 283–306)

      Dr. Peter Capper

    4. Chapter 12

      Crystal-Growth Technology for Ternary III-V Semiconductor Production by Vertical Bridgman and Vertical Gradient Freezing Methods with Accelerated Crucible Rotation Technique (pages 307–335)

      Partha S. Dutta

    5. Chapter 13

      X-Ray Diffraction Imaging of Industrial Crystals (pages 337–350)

      Keith Bowen, David Jacques, Petra Feichtinger and Matthew Wormington

  5. Part IV: Scintillator Crystals

    1. Chapter 14

      Continuous Growth of Large Halide Scintillation Crystals (pages 352–378)

      Alexander Gektin, Valentine Goriletskiy and Borys Zaslavskiy

    2. Chapter 17

      Saving Energy and Renewable Energy Through Crystal Technology (pages 435–453)

      Dr.-Ing. Hans J. Scheel

  6. Part V: Oxides

    1. Chapter 15

      Phase Equilibria and Growth of Langasite-Type Crystals (pages 380–414)

      Satoshi Uda, Shou-Qi Wang, Hiromitsu Kimura and Xinming Huang

    2. Chapter 16

      Flame-Fusion (Verneuil) Growth of Oxides (pages 415–434)

      Hans J. Scheel and Leonid Lytvynov

  7. Part VII: Crystal Machining

    1. Chapter 18

      Crystal Sawing Technology (pages 456–474)

      Hans J. Möller

    2. Chapter 19

      Plasma Chemical Vaporization Machining and Elastic Emission Machining (pages 475–495)

      Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi and Yuzo Mori

    1. You have free access to this content
      Index (pages 497–505)

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