Crystal Growth Technology: Semiconductors and Dielectrics

Crystal Growth Technology: Semiconductors and Dielectrics

Editor(s): Peter Capper, Peter Rudolph

Published Online: 19 JUL 2010

Print ISBN: 9783527325931

Online ISBN: 9783527632879

DOI: 10.1002/9783527632879

About this Book

Semiconductors and dielectrics are two essential materials found in cell phones and computers, for example, and both are manufactured by growing crystals.
Edited by the organizers of the International Workshop on Crystal Growth Technology, this ready reference is essential reading for materials scientists, chemists, physicists, computer hardware manufacturers, engineers, and those working in the chemical and semiconductor industries. They have assembled an international team of experts who present the current challenges, latest methods and new applications for producing these materials necessary for the electronics industry using bulk crystal growth technology.
From the contents:
* General aspects of crystal growth technology
* Compound semiconductors
* Halides and oxides
* Crystal growth for sustaining energy
* Crystal machining

Table of contents

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  1. Part I: Basic Concepts in Crystal Growth Technology

    1. Chapter 2

      Modeling of Vapor-Phase Growth of SiC and AlN Bulk Crystals (pages 25–39)

      Roman A. Talalaev, Alexander S. Segal, Eugene V. Yakovlev and Andrey N. Vorob'ev

  2. Part II: Semiconductors

    1. Chapter 6

      The Growth of Semiconductor Crystals (Ge, GaAs) by the Combined Heater Magnet Technology (pages 101–120)

      Prof. Dr. Peter Rudolph, Matthias Czupalla, Christiane Frank-Rotsch, Frank-Michael Kiessling and Bernd Lux

    2. Chapter 7

      Manufacturing of Bulk AlN Substrates (pages 121–135)

      Oleg V. Avdeev, Tatiana Yu. Chemekova, Heikki Helava, Yuri N. Makarov, Evgenii N. Mokhov, Sergei S. Nagalyuk, M. G. Ramm, Alexander S. Segal and Alexander I. Zhmakin

  3. Part III: Dielectrics

    1. Chapter 12

      Modeling and Optimization of Oxide Crystal Growth (pages 211–227)

      Svetlana E. Demina, Vladimir V. Kalaev, Alexander T. Kuliev, Kirill M. Mazaev and Alexander I. Zhmakin

    2. Chapter 13

      Advanced Material Development for Inertial Fusion Energy (IFE) (pages 229–248)

      Kathleen Schaffers, Andrew J. Bayramian, Joseph A. Menapace, Gregory T. Rogowski, Thomas F. Soules, Christopher A. Stolz, Steve B. Sutton, John B. Tassano, Peter A. Thelin, Christopher A. Ebbers, John A. Caird, Christopher P. J. Barty, Mark A. Randles, Charles Porter, Yiting Fei and Bruce H. T. Chai

  4. Part IV: Crystal Machining

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