Mechanical Stress on the Nanoscale: Simulation, Material Systems and Characterization Techniques

Mechanical Stress on the Nanoscale: Simulation, Material Systems and Characterization Techniques

Editor(s): Margrit Hanbücken, Pierre Müller, Ralf B. Wehrspohn

Published Online: 12 DEC 2011 10:11AM EST

Print ISBN: 9783527410668

Online ISBN: 9783527639540

DOI: 10.1002/9783527639540

About this Book

Bringing together experts from the various disciplines involved, this first comprehensive overview of the current level of stress engineering on the nanoscale is unique in combining the theoretical fundamentals with simulation methods, model systems and characterization techniques.
Essential reading for researchers in microelectronics, optoelectronics, sensing, and photonics.

Table of contents

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  1. Part One: Fundamentals of Stress and Strain on the Nanoscale

  2. Part Two: Model Systems with Stress-Engineered Properties

    1. Chapter 6

      Strained Silicon Nanodevices (pages 131–150)

      Manfred Reiche, Oussama Moutanabbir, Jan Hoentschel, Angelika Hähnel, Stefan Flachowsky, Ulrich Gösele and Manfred Horstmann

  3. Part Three: Characterization Techniques of Measuring Stresses on the Nanoscale

    1. Chapter 11

      X-Ray Diffraction Analysis of Elastic Strains at the Nanoscale (pages 233–258)

      Olivier Thomas, Odile Robach, Stéphanie Escoubas, Jean-Sébastien Micha, Nicolas Vaxelaire and Olivier Perroud

    2. Chapter 15

      Strain-Induced Nonlinear Optics in Silicon (pages 333–355)

      Clemens Schriever, Christian Bohley and Prof. Dr. Ralf B. Wehrspohn

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