Mechanical Stress on the Nanoscale: Simulation, Material Systems and Characterization Techniques

Copyright © 2011 Wiley-VCH Verlag GmbH & Co. KGaA

Mechanical Stress on the Nanoscale: Simulation, Material Systems and Characterization Techniques

Editor(s): Margrit Hanbücken, Pierre Müller, Ralf B. Wehrspohn

Published Online: 12 DEC 2011 10:11AM EST

Print ISBN: 9783527410668

Online ISBN: 9783527639540

DOI: 10.1002/9783527639540

About this Book

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Bringing together experts from the various disciplines involved, this first comprehensive overview of the current level of stress engineering on the nanoscale is unique in combining the theoretical fundamentals with simulation methods, model systems and characterization techniques.
Essential reading for researchers in microelectronics, optoelectronics, sensing, and photonics.

Table of contents

    1. You have free access to this content
      Front Matter (pages I–XXI)

  2. Part One: Fundamentals of Stress and Strain on the Nanoscale

    1. Chapter 1

      Elastic Strain Relaxation: Thermodynamics and Kinetics (pages 1–26)

      Frank Glas

    2. Chapter 2

      Fundamentals of Stress and Strain at the Nanoscale Level: Toward Nanoelasticity (pages 27–59)

      Dr. Pierre Müller

    3. Chapter 3

      Onset of Plasticity in Crystalline Nanomaterials (pages 61–82)

      Laurent Pizzagalli, Sandrine Brochard and Julien Godet

    4. Chapter 4

      Relaxations on the Nanoscale: An Atomistic View by Numerical Simulations (pages 83–106)

      Christine Mottet

  3. Part Two: Model Systems with Stress-Engineered Properties

    1. Chapter 5

      Accommodation of Lattice Misfit in Semiconductor Heterostructure Nanowires (pages 107–129)

      Volker Schmidt and Joerg V. Wittemann

    2. Chapter 6

      Strained Silicon Nanodevices (pages 131–150)

      Manfred Reiche, Oussama Moutanabbir, Jan Hoentschel, Angelika Hähnel, Stefan Flachowsky, Ulrich Gösele and Manfred Horstmann

    3. Chapter 7

      Stress-Driven Nanopatterning in Metallic Systems (pages 151–167)

      Vincent Repain, Sylvie Rousset and Shobhana Narasimhan

    4. Chapter 8

      Semiconductor Templates for the Fabrication of Nano-Objects (pages 169–188)

      Joël Eymery, Laurence Masson, Houda Sahaf and Dr. Margrit Hanbücken

  4. Part Three: Characterization Techniques of Measuring Stresses on the Nanoscale

    1. Chapter 9

      Strain Analysis in Transmission Electron Microscopy: How Far can we go? (pages 189–212)

      Anne Ponchet, Christophe Gatel, Christian Roucau and Marie-José Casanove

    2. Chapter 10

      Determination of Elastic Strains Using Electron Backscatter Diffraction in the Scanning Electron Microscope (pages 213–231)

      Michael Krause, Matthias Petzold and Ralf B. Wehrspohn

    3. Chapter 11

      X-Ray Diffraction Analysis of Elastic Strains at the Nanoscale (pages 233–258)

      Olivier Thomas, Odile Robach, Stéphanie Escoubas, Jean-Sébastien Micha, Nicolas Vaxelaire and Olivier Perroud

    4. Chapter 12

      Diffuse X-Ray Scattering at Low-Dimensional Structures in the System SiGe/Si (pages 259–274)

      Michael Hanke

    5. Chapter 13

      Direct Measurement of Elastic Displacement Modes by Grazing Incidence X-Ray Diffraction (pages 275–297)

      Geoffroy Prévot

    6. Chapter 14

      Submicrometer-Scale Characterization of Solar Silicon by Raman Spectroscopy (pages 299–332)

      Michael Becker, George Sarau and Silke Christiansen

    7. Chapter 15

      Strain-Induced Nonlinear Optics in Silicon (pages 333–355)

      Clemens Schriever, Christian Bohley and Prof. Dr. Ralf B. Wehrspohn

    1. You have free access to this content
      Index (pages 357–358)

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