Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials

Editor(s): Nicola Pinna, Mato Knez

Published Online: 2 JAN 2012 02:01PM EST

Print ISBN: 9783527327973

Online ISBN: 9783527639915

DOI: 10.1002/9783527639915

About this Book

Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique).

This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Table of contents

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  1. Part One: Introduction to ALD

    1. Chapter 5

      Molecular Layer Deposition of Hybrid Organic–Inorganic Films (pages 83–107)

      Steven M. George, Byunghoon Yoon, Robert A. Hall, Aziz I. Abdulagatov, Zachary M. Gibbs, Younghee Lee, Dragos Seghete and Byoung H. Lee

    2. Chapter 7

      Plasma Atomic Layer Deposition (pages 131–157)

      Erwin Kessels, Harald Profijt, Stephen Potts and Richard van de Sanden

  2. Part Two: Nanostructures by ALD

    1. Chapter 14

      Coating of Carbon Nanotubes (pages 327–343)

      Catherine Marichy, Andrea Pucci, Marc-Georg Willinger and Nicola Pinna

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