High-k Gate Dielectrics for CMOS Technology
Copyright © 2012 Wiley-VCH Verlag GmbH & Co. KGaA
Editor(s): Gang He, Zhaoqi Sun
Published Online: 23 AUG 2012 06:24AM EST
Print ISBN: 9783527330324
Online ISBN: 9783527646340
About this Book
About The Product
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions.
As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Topics covered include downscaling limits of current transistor designs, deposition techniques for high-k dielectric materials, electrical characterization of the resulting devices, and an outlook towards future transistor stacking technology.
Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.