High-k Gate Dielectrics for CMOS Technology

High-k Gate Dielectrics for CMOS Technology

Editor(s): Gang He, Zhaoqi Sun

Print ISBN: 9783527330324

Online ISBN: 9783527646340

DOI: 10.1002/9783527646340

Author Biography


About the Author

Gang He is Professor at the School of Physics and Materials Science of the Anhui University, China. He obtained his academic degrees from the Institute of Solid State Physics of the Chinese Academy of Sciences. His research interests and efforts cover the areas of the preparation, characterization, fundamental understanding and associated applications of high-k gate dielectric thin films. Due to his outstanding performance in research work, he won a scholarship award from the Chinese Academy of Sciences in 2005 and a grant of the Japanese Society for the Promotion of Science in 2006.

Zhaoqi Sun is the President of the School of Physics and Materials Science at the Anhui University. He graduated from Sichuan University and obtained his academic degrees from the University of Science and Technology of China. His research is focused on functional thin film materials for applications in microelectronics. Zhaoqi Sun has authored more than 140 scientific publications and has received numerous scientific awards, including the Science and Technology Award of the Anhui Province and an Outstanding Teacher Award.

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