18. Interdiffusion in Thin Films

  1. Milan Paunovic1 and
  2. Mordechay Schlesinger2

Published Online: 21 NOV 2005

DOI: 10.1002/0470009403.ch18

Fundamentals of Electrochemical Deposition, Second Edition

Fundamentals of Electrochemical Deposition, Second Edition

How to Cite

Paunovic, M. and Schlesinger, M. (2006) Interdiffusion in Thin Films, in Fundamentals of Electrochemical Deposition, Second Edition, John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/0470009403.ch18

Author Information

  1. 1

    Formerly with IBM Research Division, Yorktown Heights, NY, USA

  2. 2

    University of Windsor, Windsor, Ontario, Canada

Publication History

  1. Published Online: 21 NOV 2005
  2. Published Print: 17 JUL 2006

ISBN Information

Print ISBN: 9780471712213

Online ISBN: 9780470009406

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Keywords:

  • interdiffusion in thin films;
  • diffusion in electrodeposits;
  • diffusion welding

Summary

This chapter contains sections titled:

  • Introduction

  • Diffusion in Electrodeposits

  • Voids

  • Diffusion Barriers

  • Diffusion Welding

  • Electromigration

  • Diffusion in Electrodeposition

  • Surface Waviness in Thin Films

  • References and Further Reading

  • Problems