2. Lithographic Applications of Highly Metallized Polyferrocenylsilanes
- Alaa S. Abd-El-Aziz2,
- Charles E. Carraher Jr.3,
- Charles U. Pittman Jr.4,
- Martel Zeldin5
Published Online: 19 OCT 2005
DOI: 10.1002/0471747319.ch2
Copyright © 2006 John Wiley & Sons, Inc.
Book Title

Macromolecules Containing Metal and Metal-Like Elements: Transition Metal-Containing Polymers, Volume 6
Additional Information
How to Cite
Cheng, A. Y., Clendenning, S. B. and Manners, I. (2005) Lithographic Applications of Highly Metallized Polyferrocenylsilanes, in Macromolecules Containing Metal and Metal-Like Elements: Transition Metal-Containing Polymers, Volume 6 (eds A. S. Abd-El-Aziz, C. E. Carraher, C. U. Pittman and M. Zeldin), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/0471747319.ch2
Editor Information
- 2
Department of Chemistry, The University of Winnipeg, Winnipeg, Manitoba, R3B 2E9, Canada
- 3
Department of Chemistry and Biochemistry, Florida Atlantic University, Boca Raton, FL 33431 and Florida Center for Environmental Studies, Palm Beach Gardens, FL 33410, Florida, USA
- 4
Department of Chemistry, Mississippi State University, Mississippi State, Mississippi, USA
- 5
Department of Chemistry, University of Richmond, Richmond, Virginia, USA
Publication History
- Published Online: 19 OCT 2005
- Published Print: 7 OCT 2005
ISBN Information
Print ISBN: 9780471684459
Online ISBN: 9780471747314
- Summary
- Chapter
Keywords:
- XPS;
- TOF SIMS;
- polyferrocenylsilanes;
- ferrocene-containing polymers;
- lithographic resists;
- resists;
- surface patterning;
- metallized polyferrocenylsilanes;
- ROP;
- TEM
Summary
The use of ferrocene-containing polymers to act as lithographic resists is presented. The patterning of surfaces allows the fabrication of materials with useful optical, electrical, magnetic, catalytic, sensing properties is described using polyferrocenylsilanes. Physical characterization of these important materials is given.
