Chapter 5. Fundamental and Practical Aspects of the Electroless Deposition Reaction

  1. Prof. Richard C. Alkire2 and
  2. Prof. Dieter M. Kolb3
  1. Eugene J. O'Sullivan

Published Online: 18 DEC 2001

DOI: 10.1002/3527600264.ch5

Advances in Electrochemical Science and Engineering, Volume 7

Advances in Electrochemical Science and Engineering, Volume 7

How to Cite

O'Sullivan, E. J. (2001) Fundamental and Practical Aspects of the Electroless Deposition Reaction, in Advances in Electrochemical Science and Engineering, Volume 7 (eds R. C. Alkire and D. M. Kolb), Wiley-VCH Verlag GmbH, Weinheim, FRG. doi: 10.1002/3527600264.ch5

Editor Information

  1. 2

    University of Illinois, Department of Chemical Engineering, 209 Rodger Adams Laboratory, Box C-3, 600 South Mathews Avenue, Urbana, IL 61801, USA

  2. 3

    University of Ulm, Department of Electrochemistry, Albert-Einstein-Allee 47, 89081 Ulm, Germany

Author Information

  1. IBM Corporation, T. J. Watson Research Center, P. O. Box 218, Yorktown Heights, NY 10598-0218, Tel: 914-945-3997, FAX: 914-945-4520

Publication History

  1. Published Online: 18 DEC 2001
  2. Published Print: 19 DEC 2001

ISBN Information

Print ISBN: 9783527298303

Online ISBN: 9783527600267

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Keywords:

  • electroless deposition;
  • mixed potential theory;
  • catalytic aspects;
  • mechanistic aspects;
  • hydrogen evolution;
  • electroless Ni and Co;
  • electroless Cu;
  • alternative reducing agents;
  • formaldehyde;
  • alloy deposition;
  • solution composition;
  • solution stability;
  • deposition kinetics;
  • deposit uniformity;
  • metal ion;
  • complexation;
  • metal ion diffusion control;
  • solution additives;
  • dissolved oxygen gas

Summary

  • Introduction

    • Electroless deposition: basic process

  • Mixed potential theory and electroless deposition

    • General principles

    • Mixed potential theory: experimental observations

  • Catalytic and mechanistic aspects of electroless deposition

    • Catalytic aspects

    • Mechanistic overview

      • Hydrogen evolution in electroless deposition

    • Electroless Ni and Co

    • Electroless Cu

      • Alternative reducing agents to formaldehyde

    • Alloy deposition

      • Alloys not containing refractory metals

      • Alloys containing catalytically inactive metals

  • Solution composition: effect of solution stability, deposition kinetics, and deposit uniformity

    • Metal ion

      • Complexation

      • Consequences of metal ion diffusion control

    • Solution additives

    • Dissolved oxygen gas

  • Conclusions

    • Applied considerations

    • Fundamental considerations