Chapter 2. The Chemical Dissolution of Silicon

  1. Dr. Volker Lehmann

Published Online: 6 MAR 2002

DOI: 10.1002/3527600272.ch2

Electrochemistry of Silicon: Instrumentation, Science, Materials and Applications

Electrochemistry of Silicon: Instrumentation, Science, Materials and Applications

How to Cite

Lehmann, V. (2002) The Chemical Dissolution of Silicon, in Electrochemistry of Silicon: Instrumentation, Science, Materials and Applications, Wiley-VCH Verlag GmbH, Weinheim, FRG. doi: 10.1002/3527600272.ch2

Author Information

  1. Infineon Technologies AG, Corporate Research, Otto-Hahn-Ring 6, 81739 München, Germany

Publication History

  1. Published Online: 6 MAR 2002
  2. Published Print: 22 FEB 2002

ISBN Information

Print ISBN: 9783527293216

Online ISBN: 9783527600274

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Keywords:

  • chemical dissolution;
  • wet processing of silicon;
  • surface conditions;
  • cleaning procedures;
  • chemical etching;
  • defect delineation;
  • junction delineation;
  • selective etching;
  • thin film materials

Summary

  • The Basics of Wet Processing of Silicon

  • Silicon Surface Conditions and Cleaning Procedures

    • The Hydrophobic Silicon Surface

    • The Hydrophilic Silicon Surface

  • Chemical Etching in Alkaline Solutions

  • Chemical Etching in Acidic Solutions

  • Defect and Junction Delineation

  • Selective Etching of Common Thin Film Materials