Chapter 8. Freeman and Bernas Ion Sources

  1. Ian G. Brown
  1. Marvin Farley,
  2. Peter Rose and
  3. Geoffrey Ryding

Published Online: 4 JUL 2005

DOI: 10.1002/3527603956.ch8

The Physics and Technology of Ion Sources, Second Edition

The Physics and Technology of Ion Sources, Second Edition

How to Cite

Farley, M., Rose, P. and Ryding, G. (2004) Freeman and Bernas Ion Sources, in The Physics and Technology of Ion Sources, Second Edition (ed I. G. Brown), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, FRG. doi: 10.1002/3527603956.ch8

Editor Information

  1. Lawrence Berkeley National Laboratory, Berkeley, California, USA

Author Information

  1. Applied Orion Group, Beverly, Massachusetts, USA

Publication History

  1. Published Online: 4 JUL 2005
  2. Published Print: 25 AUG 2004

ISBN Information

Print ISBN: 9783527404100

Online ISBN: 9783527603954

SEARCH

Keywords:

  • ion sources;
  • Freeman ion source;
  • Bernas ion source;
  • plasma;
  • sheath potentials;
  • ion heating;
  • electrode cleaning;
  • insulator cleaning

Summary

This chapter contains sections titled:

  • Introduction

  • The Freeman Ion Source

  • The Bernas Ion Source

  • Further Discussion of the Source Plasma

    • Plasma and Sheath Potentials

    • Effect of Sputtering on the Plasma

    • Ion Heating of the Cathode and Anticathode in the Bernas Source

    • Current Balance in the Freeman Source

    • Current Balance in the Bernas Source

  • Control Systems

    • Freeman and Bernas Controls

    • Bernas Indirectly Heated Cathode

  • Lifetime and Maintenance Issues

    • Use of BF3

    • Use of PH3, AsH3, P4, and As4

    • Use of Sb, Sb2O3, and SbF3

    • Use of SiF4 and GeF4

    • General Guidelines for the Use of Other Organic and Inorganic Compounds

    • Electrode Cleaning and Maintenance

    • Insulator Cleaning and Maintenance