Chapter 18. Amorphous Electrically Conducting Materials for Transducer Applications

  1. Prof. Dr. Hans-Jörg Fecht3,4 and
  2. Dr. Matthias Werner5
  1. Alex Dommann1,
  2. Marco Cucinelli1,
  3. Dr. Matthias Werner5 and
  4. Marc-Aurele Nicolet2

Published Online: 13 JUL 2005

DOI: 10.1002/3527604111.ch18

The Nano-Micro Interface: Bridging the Micro and Nano Worlds

The Nano-Micro Interface: Bridging the Micro and Nano Worlds

How to Cite

Dommann, A., Cucinelli, M., Werner, M. and Nicolet, M.-A. (2004) Amorphous Electrically Conducting Materials for Transducer Applications, in The Nano-Micro Interface: Bridging the Micro and Nano Worlds (eds H.-J. Fecht and M. Werner), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, FRG. doi: 10.1002/3527604111.ch18

Editor Information

  1. 3

    University of Ulm, Faculty of Engineering, Materials Division, Albert-Einstein-Allee 47, 89081 Ulm, Germany

  2. 4

    Forschungszentrum Karlsruhe, Institute of Nanotechnology (INT), P.O. Box 3640, 76021 Karlsruhe, Germany

  3. 5

    NMTC, Soorstrasse 86, 14050 Berlin, Germany

Author Information

  1. 1

    Interstate University of Applied Science, Institute for Microsystems NTB, Werdenbergstrasse 4, 9471 Buchs, Switzerland

  2. 2

    California Institute of Technology, Pasadena, CA 91125, USA

  3. 5

    NMTC, Soorstrasse 86, 14050 Berlin, Germany

Publication History

  1. Published Online: 13 JUL 2005
  2. Published Print: 23 SEP 2004

ISBN Information

Print ISBN: 9783527309788

Online ISBN: 9783527604111

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Keywords:

  • nano–micro interface;
  • amorphous electrically conducting materials;
  • transducer applications;
  • mictamict alloys;
  • thin films;
  • Ta–Si–N films

Summary

This chapter contains sections titled:

  • Introduction

  • Mictamict Alloys

  • Thin Films

  • Properties of Ta–Si–N Films

  • MEMS of Ta–Si–N Films

  • Surface Micromachining of Ta–Si–N Microbeams

  • X-Ray Analysis of Ta–Si–N Films

  • Ta–Si–N Thin Films as Diffusion Barriers for Cu Metallization