Hard Ferrite Films Prepared by Electron Beam Evaporation for Microwave Applications

  1. Prof. Dr. M. Rühle2 and
  2. Prof. Dr. H. Gleiter3
  1. I. Wane,
  2. F. Cosset,
  3. A. Bessaudou,
  4. A. Célérier,
  5. C. Girault,
  6. J.L. Decossas and
  7. J.C. Vareille

Published Online: 23 DEC 2005

DOI: 10.1002/352760622X.ch9

Interface Controlled Materials, Volume 9

Interface Controlled Materials, Volume 9

How to Cite

Wane, I., Cosset, F., Bessaudou, A., Célérier, A., Girault, C., Decossas, J.L. and Vareille, J.C. (2000) Hard Ferrite Films Prepared by Electron Beam Evaporation for Microwave Applications, in Interface Controlled Materials, Volume 9 (eds M. Rühle and H. Gleiter), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, FRG. doi: 10.1002/352760622X.ch9

Editor Information

  1. 2

    Max-Planck-Institut für Metallforschung, Seestraße 92, 70174 Stuttgart, Germany

  2. 3

    Forschungszentrum Karlsruhe, Postfach 3640, 76021 Karlsruhe, Germany

Author Information

  1. Laboratoire IRCOM (UMR 6615) / Equipe Capteur Microélectronique et Microoptiques 123, avenue Albert Thomas - 87060 Limoges Cedex, France

Publication History

  1. Published Online: 23 DEC 2005
  2. Published Print: 27 JUN 2000

Book Series:

  1. EUROMAT 99

ISBN Information

Print ISBN: 9783527301911

Online ISBN: 9783527606221

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Keywords:

  • interface controlled materials;
  • hard ferrite films;
  • electron beam evaporation;
  • microwave applications

Summary

This work deals with the study of barium hexaferrite films high rate deposition. The bulk material deposited has the formula BaFe12O19.