Magnetic Interactions in CoCr/Cr Thin Films Sputtered with Different Gases

  1. Dr. K. Grassie2,
  2. Prof. Dr. E. Teuckhoff3,
  3. Prof. Dr. G. Wegner4,
  4. Prof. Dr. J. Hausselt5 and
  5. Prof. Dr. H. Hanselka6
  1. H. Z. Jia,
  2. J. Veldeman and
  3. M. Burgelman

Published Online: 27 APR 2006

DOI: 10.1002/3527607420.ch6

Functional Materials, Volume 13

Functional Materials, Volume 13

How to Cite

Jia, H. Z., Veldeman, J. and Burgelman, M. (2000) Magnetic Interactions in CoCr/Cr Thin Films Sputtered with Different Gases, in Functional Materials, Volume 13 (eds K. Grassie, E. Teuckhoff, G. Wegner, J. Hausselt and H. Hanselka), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, FRG. doi: 10.1002/3527607420.ch6

Editor Information

  1. 2

    Philips Forschungslaboratorium, Postfach 500145, 52085 Aachen, Germany

  2. 3

    Siemens AG, Postfach 3240, 91050 Erlangen, Germany

  3. 4

    Max-Planck-Institut für Polymerforschung, Ackermannweg 10, 55128 Mainz, Germany

  4. 5

    Forschungszentrum Karlsruhe, Postfach 3640, 76201 Karlsruhe, Germany

  5. 6

    Institut für Mechanik, Otto-von-Guericke-Universität Magdeburg, Universitätsplatz 2, 39160 Magdeburg, Germany

Author Information

  1. University of Gent, Electronics and Information Systems (ELIS), B-9000 Gent, Belgium

Publication History

  1. Published Online: 27 APR 2006
  2. Published Print: 27 JUN 2000

Book Series:

  1. EUROMAT 99

ISBN Information

Print ISBN: 9783527302543

Online ISBN: 9783527607426

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Keywords:

  • functional materials;
  • magnetic films;
  • DC magnetron sputtering;
  • AFM topography;
  • magnetic measurement;
  • cobalt chromium;
  • PET substrate

Summary

Magnetic properties are studied within the thin Co88Cr12/Cr films sputtered either with pure argon gas or with a helium-argon (10:3) gas mixture. Through comparison of coercivities, coercive squarenesses, ΔM(H) and SFDdc plots of these films, the effects of variable underlayer and magnetic layer thickness are studied. There is a strong correlation between magnetic interactions in films and sputter gas types. These results indicate the crystal texture of the films sputtered in different types of gas is different. With XRD measurement, the crystal orientation ratio in the films sputtered in pure argon is different from that in the gas mixture. AFM images prove that the thin films sputtered in the mixture have smaller grain sizes than those sputtered in pure argon.