Halomethyl Derivatives of Silicon, Germanium, and Tin by the Diazomethane Method

  1. Eugene G. Rochow
  1. Dietmar Seyferth1,
  2. Eugene G. Rochow2,
  3. Julian B. Honeycutt Jr.3 and
  4. Robert C. Bryan3

Published Online: 5 JAN 2007

DOI: 10.1002/9780470132371.ch12

Inorganic Syntheses, Volume 6

Inorganic Syntheses, Volume 6

How to Cite

Seyferth, D., Rochow, E. G., Honeycutt, J. B. and Bryan, R. C. (1960) Halomethyl Derivatives of Silicon, Germanium, and Tin by the Diazomethane Method, in Inorganic Syntheses, Volume 6 (ed E. G. Rochow), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470132371.ch12

Editor Information

  1. Harvard University

Author Information

  1. 1

    Massachusetts Institute of Technology, Cambridge, Mass.

  2. 2

    Harvard University, Cambridge, Mass.

  3. 3

    Ethyl Corporation, Baton Rouge, La.

Publication History

  1. Published Online: 5 JAN 2007
  2. Published Print: 1 JAN 1960

Book Series:

  1. Inorganic Syntheses

ISBN Information

Print ISBN: 9780470131657

Online ISBN: 9780470132371

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Keywords:

  • halomethyl derivatives;
  • silicon;
  • germanium;
  • tin;
  • diazomethane method

Summary

The prelims comprise:

  • A. (chloromethyl)dichlorosilane

  • B. (chloromethyl)trichlorogermane

  • C. chloromethyldimethyltin chloride