39. Optimization of Photoresist Profile Using Simulation

  1. Dr. Genichi Taguchi engineering Executive Director Honorary Member,
  2. Dr. Subir Chowdhury aerospace engineering, industrial management chairman CEO world leader strategist author honorary member honorary doctorate and
  3. Yuin Wu B.S. in chemical engineering professor Executive Director consultant

Published Online: 26 NOV 2007

DOI: 10.1002/9780470258354.cs39

Taguchi's Quality Engineering Handbook

Taguchi's Quality Engineering Handbook

How to Cite

Taguchi, G., Chowdhury, S. and Wu, Y. (2004) Optimization of Photoresist Profile Using Simulation, in Taguchi's Quality Engineering Handbook, John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470258354.cs39

Author Information

  1. American Supplier Institute (ASI), USA

Publication History

  1. Published Online: 26 NOV 2007
  2. Published Print: 22 OCT 2004

ISBN Information

Print ISBN: 9780471413349

Online ISBN: 9780470258354

SEARCH

Keywords:

  • micromachining in semiconductor manufacturing;
  • photomask patterning process;
  • photoresist optimization profile using simulation;
  • SN ratio and sensitivity confirmation;
  • nominal-the-best SN ratio

Summary

This chapter contains sections titled:

  • Introduction

  • Simulation

  • Parameter Design with Position in Thickness Direction as Noise Factor

  • Parameter Design with Position in Thickness Direction as Indicative Factor

  • Confirmatory Calculation and Comparison with Actual Pattern for Photoresist

  • Reference