25. Coatings of Fe/FeAIN Thin Films

  1. Dongming Zhu,
  2. Uwe Schulz,
  3. Andrew Wereszczak and
  4. Edgar Lara-Curzio
  1. Yuandan Liu1,
  2. R. E. Miller1,
  3. Tao Zhang1,
  4. Qiquan Feng1,
  5. W. Votava1,
  6. Dingqiang Li1,
  7. L. N. Dunkleberger1,
  8. X. W. Wang1,
  9. R. Gray2,
  10. T. Bibens2,
  11. J. Heifer2,
  12. K. Mooney3,
  13. R. Nowak3,
  14. P. Lubitz4 and
  15. Yanwen Zhang5

Published Online: 26 MAR 2008

DOI: 10.1002/9780470291320.ch25

Advanced Ceramic Coatings and Interfaces: Ceramic Engineering and Science Proceedings, Volume 27, Issue 3

Advanced Ceramic Coatings and Interfaces: Ceramic Engineering and Science Proceedings, Volume 27, Issue 3

How to Cite

Liu, Y., Miller, R. E., Zhang, T., Feng, Q., Votava, W., Li, D., Dunkleberger, L. N., Wang, X. W., Gray, R., Bibens, T., Heifer, J., Mooney, K., Nowak, R., Lubitz, P. and Zhang, Y. (2006) Coatings of Fe/FeAIN Thin Films, in Advanced Ceramic Coatings and Interfaces: Ceramic Engineering and Science Proceedings, Volume 27, Issue 3 (eds D. Zhu, U. Schulz, A. Wereszczak and E. Lara-Curzio), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470291320.ch25

Author Information

  1. 1

    Alfred University Alfred, NY 14802

  2. 2

    BTI Rochester, NY 14586

  3. 3

    SUNY Buffalo Buffalo, NY 14260

  4. 4

    Naval Research Laboratory Washington, DC 20375

  5. 5

    Pacific Northwest National Laboratory Richland, WA 99352

Publication History

  1. Published Online: 26 MAR 2008
  2. Published Print: 1 JAN 2006

ISBN Information

Print ISBN: 9780470080535

Online ISBN: 9780470291320

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Keywords:

  • SEM;
  • EDS;
  • XRD;
  • RBS;
  • ESCA;
  • XPS

Summary

We report new results on materials properties of Fe/FeAIN thin films. Films were fabricated via a pulsed DC sputtering technique. Sputtering target materials were FexAl1-x, where × varies from 0.025 to 1. Film thickness varied from 0.01 to 4 micrometers, and particle size varied from 5 to 100 nanometers, depending on the fabrication conditions and target materials. A film with 22 layers was also fabricated via the sputtering technique. Materials properties of the films were analyzed by SEM/EDS, XRD, RBS and ESCA (XPS).