Chapter 33. Reflectance of CVD TiB2 Films

  1. Ersan Ustundag and
  2. Gary Fischman
  1. W. Jack Lackey1 and
  2. Bruce N. Beckloff2

Published Online: 26 MAR 2008

DOI: 10.1002/9780470294567.ch33

23rd Annual Conference on Composites, Advanced Ceramics, Materials, and Structures : A: Ceramic Engineering and Science Proceedings, Volume 20, Issue 3

23rd Annual Conference on Composites, Advanced Ceramics, Materials, and Structures : A: Ceramic Engineering and Science Proceedings, Volume 20, Issue 3

How to Cite

Lackey, W. J. and Beckloff, B. N. (1999) Reflectance of CVD TiB2 Films, in 23rd Annual Conference on Composites, Advanced Ceramics, Materials, and Structures : A: Ceramic Engineering and Science Proceedings, Volume 20, Issue 3 (eds E. Ustundag and G. Fischman), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470294567.ch33

Author Information

  1. 1

    Georgia Institute of Technology George W. Woodruff School of Mechanical Engineering Atlanta, Georgia 30332–0405 USA

  2. 2

    Georgia Institute of Technology School of Materials Science and Engineering Atlanta, Georgia 30332–0245 USA

Publication History

  1. Published Online: 26 MAR 2008
  2. Published Print: 1 JAN 1999

ISBN Information

Print ISBN: 9780470375631

Online ISBN: 9780470294567

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Keywords:

  • polycrystalline;
  • deposition;
  • microelectronics;
  • statistical;
  • diffraction

Summary

The process-structure-reflectance interrelationships for TiB2 films prepared by CVD were determined. A hot wall CVD reactor employing graphite substrates and the TiCl4 + BCl3 + H2 reagent system were used at pressures of 2.7 and 6.7 kPa. Single phase polycrystalline TiB2 films were obtained. An increasing percentage of the grains were oriented with their (001) planes parallel to the substrate as the deposition temperature was increased and as the BCl3:TiCl4 ratio decreased. Grain size increased from ∼0.5 to 3 μm as the deposition temperature was increased from 900 to 1100°C and as the coating rate was decreased from 0.6 to 0.1 μm/min. Fine-grained, smooth, highly reflective films were obtained at low deposition temperatures and high BCl3:TiCl4 ratios.