Chapter 56. On the Mechanism of MoSiz Pesting in the Temperature Range 400–500°C.

  1. Todd Jessen and
  2. Ersan Ustundag
  1. K. Hansson1,
  2. M. Halvarsson2,
  3. J. E. Tang3,
  4. J. E. Svensson4,
  5. M. Sundherg5 and
  6. R. Poinpe6

Published Online: 28 MAR 2008

DOI: 10.1002/9780470294635.ch56

24th Annual Conference on Composites, Advanced Ceramics, Materials, and Structures: B: Ceramic Engineering and Science Proceedings, Volume 21, Issue 4

24th Annual Conference on Composites, Advanced Ceramics, Materials, and Structures: B: Ceramic Engineering and Science Proceedings, Volume 21, Issue 4

How to Cite

Hansson, K., Halvarsson, M., Tang, J. E., Svensson, J. E., Sundherg, M. and Poinpe, R. (2008) On the Mechanism of MoSiz Pesting in the Temperature Range 400–500°C., in 24th Annual Conference on Composites, Advanced Ceramics, Materials, and Structures: B: Ceramic Engineering and Science Proceedings, Volume 21, Issue 4 (eds T. Jessen and E. Ustundag), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470294635.ch56

Author Information

  1. 1

    Dep't of Inorg. Envir. Chemistry Chalmers University of Technology SE-412 96 Gothenburg, Sweden

  2. 2

    Dep't of Exp. Physics Chalmers University of Technology SE-412 96 Gothenburg, Sweden

  3. 3

    Dep't of Inorg. Envir. Chemistry Chalmers University of Technology SE-412 96 Gothenburg, Sweden

  4. 4

    Dep't of Exp. Physics Chalmers University of Technology SE-412 96 Gothenburg, Sweden

  5. 5

    KANTHAL AB Hallstahammar, Sweden

  6. 6

    Swedish Ceramic Inst. SE-412 96 Gothenburg, Sweden

Publication History

  1. Published Online: 28 MAR 2008
  2. Published Print: 1 JAN 2000

ISBN Information

Print ISBN: 9780470375693

Online ISBN: 9780470294635

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Keywords:

  • peak pesting temperature;
  • thermogravimetric analysis;
  • low temperature oxidation;
  • pest layer;
  • scanning electron microscope

Summary

The oxidation of a MoSi2 composite was studied in the temperature range 400–500°C. The peak pesting temperature was identified and the oxidation kinetics was observed up to a holding time of 4000 hours. The reaction kinetics was tracked using thermogravimetric analysis :IS well iis oxide thickness nieasurenients. A detailed analysis of the morphology and composition of the oxide was performed using SEM and EDX. The peak pesting temperature was found to be 470°C. The reaction kinetics in static air could be described with two consecutive parabolic oxidation curves, one up to 500 hours and another between 500–4000 hours. With a higher water vapor coiitent the kinetics showed linear behwior. MoO3 evaporation took place during the entire duration of the oxidation. The oxide appeared to grow by inward diffusion of oxygen to the oxidehulk interface.