Chapter 28. BN and Si-Doped BN Coatings on Woven Fabrics

  1. Hua-Tay Lin and
  2. Mrityunjay Singh
  1. Frances I. Hurwitz1,
  2. Paul V. Chayka2,
  3. John M. Scott3 and
  4. Donald R. Wheeler4

Published Online: 26 MAR 2008

DOI: 10.1002/9780470294741.ch28

26th Annual Conference on Composites, Advanced Ceramics, Materials, and Structures: A: Ceramic Engineering and Science Proceedings, Volume 23, Issue 3

26th Annual Conference on Composites, Advanced Ceramics, Materials, and Structures: A: Ceramic Engineering and Science Proceedings, Volume 23, Issue 3

How to Cite

Hurwitz, F. I., Chayka, P. V., Scott, J. M. and Wheeler, D. R. (2002) BN and Si-Doped BN Coatings on Woven Fabrics, in 26th Annual Conference on Composites, Advanced Ceramics, Materials, and Structures: A: Ceramic Engineering and Science Proceedings, Volume 23, Issue 3 (eds H.-T. Lin and M. Singh), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470294741.ch28

Author Information

  1. 1

    NASA Glenn Research Center Cleveland, OH 44135

  2. 2

    MS&E Resources New Milford, CT 06776

  3. 3

    Refractory Composites, Inc. Glen Bumie, MD 21060

  4. 4

    SEST, Inc. Cleveland, OH 44135

Publication History

  1. Published Online: 26 MAR 2008
  2. Published Print: 1 JAN 2002

ISBN Information

Print ISBN: 9780470375785

Online ISBN: 9780470294741

SEARCH

Keywords:

  • chemical vapor infiltration;
  • ceramic fabric;
  • deposition;
  • oxygen;
  • parameters

Summary

A computer controlled, pulsed chemical vapor infiltration (CVI) system has been developed to deposit BN from a liquid borazine (B3N3H6) source, as well as silicon doped BN coatings using borazine and a silicon source, into 2-D woven ceramic fabric preforms. The coating process was evaluated as a function of deposition temperature, pressure, and precursor flow rate. Coatings were characterized by field emission scanning electron microscopy, electron dispersive spectroscopy and Auger spectroscopy. By controlling the reactant feed ratios, Si incorporation could be controlled over the range of 6–24 atomic percent.