Chapter 3. Processing of Nanocrystalline Diamond Films by Microwave Plasma Cvd

  1. Waltraud M. Kriven and
  2. Hua-Tay Lin
  1. R. Ramamurti,
  2. V. Shanov and
  3. R. N. Singh

Published Online: 27 MAR 2008

DOI: 10.1002/9780470294802.ch3

27th Annual Cocoa Beach Conference on Advanced Ceramics and Composites: A: Ceramic Engineering and Science Proceedings, Volume 24, Issue 3

27th Annual Cocoa Beach Conference on Advanced Ceramics and Composites: A: Ceramic Engineering and Science Proceedings, Volume 24, Issue 3

How to Cite

Ramamurti, R., Shanov, V. and Singh, R. N. (2003) Processing of Nanocrystalline Diamond Films by Microwave Plasma Cvd, in 27th Annual Cocoa Beach Conference on Advanced Ceramics and Composites: A: Ceramic Engineering and Science Proceedings, Volume 24, Issue 3 (eds W. M. Kriven and H.-T. Lin), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470294802.ch3

Author Information

  1. Department of Materials Science and Engineering, University of Cincinnati, P. O. Box 210012, Cincinnati, OH 45221-0012

Publication History

  1. Published Online: 27 MAR 2008
  2. Published Print: 1 JAN 2003

ISBN Information

Print ISBN: 9780470375839

Online ISBN: 9780470294802

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Keywords:

  • nanocrystalline diamond;
  • microwave plasma chemical vapor deposition;
  • polycrystalline diamond;
  • small grain films;
  • electron microscope

Summary

Nanocrystalline diamond (NCD) films are successfully deposited on silicon (100) from methane-hydrogen-noble gas microwave plasmas. Effect of argon and methane concentration, and pulsed methane introduction on the growth rate and on the film morphology are studied. In-situ mass, spectrometry of the gaseous phase is used to identify the chemical reactants and products during the Microwave Plasma Chemical Vapor Deposition (MPCVD). These results are presented and discussed.