Chapter 21. Silicon Nitride Joining with Glasses in the System CaO-SiO2

  1. John B. Wachtman Jr.
  1. Yukio Haibara1,
  2. Norimasa Umesaki2 and
  3. Nobuya Iwamoto2

Published Online: 26 MAR 2008

DOI: 10.1002/9780470312568.ch21

Proceedings of the International Forum on Structural Ceramics Joining: Ceramic Engineering and Science Proceedings, Volume 10, Issue 11/12

Proceedings of the International Forum on Structural Ceramics Joining: Ceramic Engineering and Science Proceedings, Volume 10, Issue 11/12

How to Cite

Haibara, Y., Umesaki, N. and Iwamoto, N. (1989) Silicon Nitride Joining with Glasses in the System CaO-SiO2, in Proceedings of the International Forum on Structural Ceramics Joining: Ceramic Engineering and Science Proceedings, Volume 10, Issue 11/12 (ed J. B. Wachtman), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470312568.ch21

Author Information

  1. 1

    Central Research Laboratory Sumitomo Cement Co., Ltd. 585, Toyotomi-Cho, Funabashi-City Chiba 274, Japan

  2. 2

    Welding Research Institute Osaka University 11–1 Mihogo-Oka, Ibaraki-City Osaka 567, Japan

Publication History

  1. Published Online: 26 MAR 2008
  2. Published Print: 1 JAN 1989

ISBN Information

Print ISBN: 9780470374887

Online ISBN: 9780470312568

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Keywords:

  • microscopic;
  • EPMA;
  • bond strength;
  • thermal expansion;
  • insulation-resistance

Summary

Si3N4-Si3N4 joining was accomplished by the use of glasses in the system CaO-SiO2 without any applied pressure. The properties of the glasses used and the Si3N4-glass joining reactions were carefully studied by several microscopic measurements. The EPMA and scanning auger analyses revealed that the joint layer formed by joining reaction between the Si3N4 and the glasses consisted of an oxynitride glass phase in the system Si-Ca-Y-Al-O-N with a continuous gradient of nitrogen content. The bond strength obtained from the Si3N4, joints was strong enough for practical use. We prepared Si-Ca-Y-Al-O-N oxynitride glasses with nitrogen content range of 0–4.85 at% constituting the Si3N4 joint layer, and measured several physical properties such as density, thermal expansion, crystallization temperature, and hardness. The results indicated that the Si3N4 joint layer produced look the most suitable form for accommodating the stress caused by thermal expansion mismatch between Si3N4 and glass.