Chapter 14. Chemical Vapor Deposition (CVD) Furnace Design and Manufacture
- John B. Wachtman Jr.
Published Online: 26 MAR 2008
Copyright © 1990 The American Ceramic Society, Inc.
Ceramic Manufacturing Council - Kilns and Firing: Ceramic Engineering and Science Proceedings, Volume 11, Issue 11/12
How to Cite
Shibe, B. and Conybear, J. (1990) Chemical Vapor Deposition (CVD) Furnace Design and Manufacture, in Ceramic Manufacturing Council - Kilns and Firing: Ceramic Engineering and Science Proceedings, Volume 11, Issue 11/12 (ed J. B. Wachtman), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470313107.ch14
- Published Online: 26 MAR 2008
- Published Print: 1 JAN 1990
Print ISBN: 9780470374962
Online ISBN: 9780470313107
- cold-wall vessels;
- vacuum-pumping system;
- hot process.;
Chemical vapor deposition (CVD) is based on the chemical reaction between a gaseous phase and the heated surface of the substrate. Most CVD processes are continuous-loop processes, which means that the reacting gases are fed into the system, and the by-products of reaction are exhausted out of the system, so it is a continuously flowing gaseous process.
Chemical vapor deposition is differentiated from other types of coating processes in that it is a hot process. Generally, the temperatures of deposition are in the range of 500°–1100°C. CVD systems are used to form very thin layers. The deposits attach themselves to the substrates, nucleate, and grow on the substrates using the surface as a catalyst for the deposition. Many of the CVD coatings which are deposited tend to be either rare-earth oxides, nitrides, or carbides.
CVD is an atmospheric controlled process. Most reduction CVD reactors contain vacuum-pumping systems, and the purpose of the vacuum-pumping system is twofold. First, it is to evacuate the reaction chamber to ensure that there is no oxygen present, so that deposition can occur in a clean environment. The second application would be in low-pressure CVD systems, where, naturally, the vacuum-pumping system would be utilized to maintain a low pressure.
CVD reactions are carried out at elevated temperatures. The CVD system itself can be broken down into five main components: furnace, control system, vacuum-pumping system, scrubbing system, and gas-cooling system.