Chapter 45. Microstructure and Oxidation Behaviour of Hiped Silicon Nitride
- John B. Wachtman Jr.
Published Online: 26 MAR 2008
Copyright © 1992 The American Ceramics Society
Proceedings of the 16th Annual Conference on Composites and Advanced Ceramic Materials, Part 2 of 2: Ceramic Engineering and Science Proceedings, Volume 13, Issue 9/10
How to Cite
Plucknett, K. P. and Lewis, M. H. (2008) Microstructure and Oxidation Behaviour of Hiped Silicon Nitride, in Proceedings of the 16th Annual Conference on Composites and Advanced Ceramic Materials, Part 2 of 2: Ceramic Engineering and Science Proceedings, Volume 13, Issue 9/10 (ed J. B. Wachtman), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470313978.ch45
- Published Online: 26 MAR 2008
- Published Print: 1 JAN 1994
Print ISBN: 9780470375198
Online ISBN: 9780470313978
- deposition process;
- micro-mechanical properties;
- physical vapour deposition (PVD);
Dense β-Si3N4 based ceramics in the Y-Si-O-N have been fabricated using a commercial glass-encapsulated hot-isostatic pressing process. Compositions were tailored to lie within the Si3N4-Si2N2O-Y2Si2O7 compatability triangle. Crystallisation of the inter-granular glassy phase, to Y2Si2O7 was found to occur during the cooling segment of the HIP cycle. HIPed ceramics demonstrated excellent resistance to oxidation at temperatures up to 1450°C, although surface contamination during HIPing resulted in a degradation of the oxidation resistance.