Chapter 61. Microwave Plasma Etching of Si3N4

  1. John B. Wachtman Jr.
  1. Vincent A. Knapp1,
  2. Dale E. Wittmer1,
  3. Josep H. J. Conover1 and
  4. Charles W. Miller Jr.2

Published Online: 28 MAR 2008

DOI: 10.1002/9780470314555.ch61

Proceedings of the 18th Annual Conference on Composites and Advanced Ceramic Materials - B: Ceramic Engineering and Science Proceedings, Volume 15, Issue 5

Proceedings of the 18th Annual Conference on Composites and Advanced Ceramic Materials - B: Ceramic Engineering and Science Proceedings, Volume 15, Issue 5

How to Cite

Knapp, V. A., Wittmer, D. E., Conover, J. H. J. and Miller, C. W. (1994) Microwave Plasma Etching of Si3N4, in Proceedings of the 18th Annual Conference on Composites and Advanced Ceramic Materials - B: Ceramic Engineering and Science Proceedings, Volume 15, Issue 5 (ed J. B. Wachtman), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470314555.ch61

Author Information

  1. 1

    Department of Mechanical Engineering Southern Illinois University, Carbondale, IL 62901

  2. 2

    Centorr Furnaces/Vacuum Industries Nashua, NH 03063

Publication History

  1. Published Online: 28 MAR 2008
  2. Published Print: 1 JAN 1994

ISBN Information

Print ISBN: 9780470375334

Online ISBN: 9780470314555

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