Chapter 1. Introduction

  1. Ban Wong,
  2. Franz Zach,
  3. Victor Moroz,
  4. Anurag Mittal,
  5. Greg Starr and
  6. Andrew Kahng

Published Online: 7 FEB 2008

DOI: 10.1002/9780470382820.ch1

Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes

Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes

How to Cite

Wong, B., Zach, F., Moroz, V., Mittal, A., Starr, G. and Kahng, A. (2008) Introduction, in Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes, John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470382820.ch1

Publication History

  1. Published Online: 7 FEB 2008
  2. Published Print: 6 OCT 2008

ISBN Information

Print ISBN: 9780470112809

Online ISBN: 9780470382820

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Keywords:

  • design for manufacturability (DFM);
  • chip surface topology design dependency;
  • mobility enhancement techniques and design–process interaction

Summary

This chapter contains sections titled:

  • Value of Design for Manufacturability

  • Deficiencies in Boolean-Based Design Rules in the Subwavelength Regime

  • Impact of Variability on Yield and Performance

  • Industry Challenge: The Disappearing Process Window

  • Mobility Enhancement Techniques: A New Source of Variability Induced by Design–Process Interaction

  • Design Dependency of Chip Surface Topology

  • Newly Exacerbated Narrow Width Effect in Nano-CMOS Nodes

  • Well Proximity Effect

  • Need for Model-Based DFM Solutions Beyond 65 nm

  • Summary

  • References