Chapter 1. Introduction
Published Online: 7 FEB 2008
DOI: 10.1002/9780470382820.ch1
Copyright © 2009 John Wiley & Sons, Inc.
Book Title
Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes
Additional Information
How to Cite
Wong, B., Zach, F., Moroz, V., Mittal, A., Starr, G. and Kahng, A. (2008) Introduction, in Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes, John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470382820.ch1
Publication History
- Published Online: 7 FEB 2008
- Published Print: 6 OCT 2008
ISBN Information
Print ISBN: 9780470112809
Online ISBN: 9780470382820
- Summary
- Chapter
- References
Keywords:
- design for manufacturability (DFM);
- chip surface topology design dependency;
- mobility enhancement techniques and design–process interaction
Summary
This chapter contains sections titled:
Value of Design for Manufacturability
Deficiencies in Boolean-Based Design Rules in the Subwavelength Regime
Impact of Variability on Yield and Performance
Industry Challenge: The Disappearing Process Window
Mobility Enhancement Techniques: A New Source of Variability Induced by Design–Process Interaction
Design Dependency of Chip Surface Topology
Newly Exacerbated Narrow Width Effect in Nano-CMOS Nodes
Well Proximity Effect
Need for Model-Based DFM Solutions Beyond 65 nm
Summary
References