Chapter 4. Signal and Power Integrity

  1. Ban Wong,
  2. Franz Zach,
  3. Victor Moroz,
  4. Anurag Mittal,
  5. Greg Starr and
  6. Andrew Kahng

Published Online: 7 FEB 2008

DOI: 10.1002/9780470382820.ch4

Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes

Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes

How to Cite

Wong, B., Zach, F., Moroz, V., Mittal, A., Starr, G. and Kahng, A. (2008) Signal and Power Integrity, in Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes, John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470382820.ch4

Publication History

  1. Published Online: 7 FEB 2008
  2. Published Print: 6 OCT 2008

ISBN Information

Print ISBN: 9780470112809

Online ISBN: 9780470382820

SEARCH

Keywords:

  • signal and power integrity;
  • signal integrity and inductance;
  • inductance effects on interconnect

Summary

This chapter contains sections titled:

  • Introduction

  • Interconnect Resistance, Capacitance, and Inductance

  • Inductance Effects on an Interconnect

  • References