Chapter 6. Design for Variability, Performance, and Yield

  1. Ban Wong,
  2. Franz Zach,
  3. Victor Moroz,
  4. Anurag Mittal,
  5. Greg Starr and
  6. Andrew Kahng

Published Online: 7 FEB 2008

DOI: 10.1002/9780470382820.ch6

Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes

Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes

How to Cite

Wong, B., Zach, F., Moroz, V., Mittal, A., Starr, G. and Kahng, A. (2008) Design for Variability, Performance, and Yield, in Nano-CMOS Design for Manufacturabililty: Robust Circuit and Physical Design for Sub-65 nm Technology Nodes, John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470382820.ch6

Publication History

  1. Published Online: 7 FEB 2008
  2. Published Print: 6 OCT 2008

ISBN Information

Print ISBN: 9780470112809

Online ISBN: 9780470382820

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Keywords:

  • variability, performance and yield design;
  • parametric fluctuations and new design implications;
  • restrictive design rules (RDRs) and integrated device manufacturers (IDMs)

Summary

This chapter contains sections titled:

  • Introduction

  • Impact of Variations on Design

  • Some Parametric Fluctuations with New Implications for Design

  • Process Variations in Interconnects

  • Impact of Deep-Submicron Integration in SRAMs

  • Impact of Layout Styles on Manufacturability, Yield, and Scalability

  • Design for Variations

  • Summary

  • References