8. Formation of Nanocrystalline Diamond Thin Films on Ti3SiC2 by Hot Filament Chemical Vapor Deposition

  1. Hua-Tay Lin and
  2. Dongming Zhu
  1. S. L. Yang1,
  2. Q. Yang1,
  3. W. W. Yi1,
  4. Y. Tang1,
  5. T. Regier2,
  6. R. Blyth2 and
  7. Z. M. Sun3

Published Online: 8 APR 2009

DOI: 10.1002/9780470456323.ch8

Advanced Ceramic Coatings and Interfaces III: Ceramic Engineeing and Science Proceedings, Volume 29, Issue 4

Advanced Ceramic Coatings and Interfaces III: Ceramic Engineeing and Science Proceedings, Volume 29, Issue 4

How to Cite

Yang, S. L., Yang, Q., Yi, W. W., Tang, Y., Regier, T., Blyth, R. and Sun, Z. M. (2008) Formation of Nanocrystalline Diamond Thin Films on Ti3SiC2 by Hot Filament Chemical Vapor Deposition, in Advanced Ceramic Coatings and Interfaces III: Ceramic Engineeing and Science Proceedings, Volume 29, Issue 4 (eds H.-T. Lin and D. Zhu), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470456323.ch8

Author Information

  1. 1

    Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK, Canada S7N 5A9

  2. 2

    Canadian Light Source Inc., University of Saskatchewan, 101 Perimeter Road, Saskatoon, SK, Canada, S7N OX4

  3. 3

    National Institute of Advanced Industrial Science and Technology (AIST), Shimoshidami, Moriyamaku, Nagoya 463-8560, Japan

Publication History

  1. Published Online: 8 APR 2009
  2. Published Print: 8 DEC 2008

Book Series:

  1. Ceramic Engineering and Science Proceedings

Book Series Editors:

  1. Tatsuki Ohji and
  2. Andrew Wereszczak

ISBN Information

Print ISBN: 9780470344958

Online ISBN: 9780470456323

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Keywords:

  • nanocrystalline diamond thin films;
  • chemical vapor deposition;
  • hot filament;
  • atomic force microscopy;
  • negative electron affinity

Summary

This chapter contains sections titled:

  • Abstract

  • Introduction

  • Experimental Methods

  • Results and Discussion

  • Conclusion

  • Acknowledgments

  • References