12. Photoimaging and Lithographic Processes in Polymers

  1. Norman S. Allen
  1. Marius Gabriel Ivan and
  2. Juan Cesar (tito) Scaiano

Published Online: 18 MAR 2010

DOI: 10.1002/9780470594179.ch12

Photochemistry and Photophysics of Polymer Materials

Photochemistry and Photophysics of Polymer Materials

How to Cite

Gabriel Ivan, M. and Cesar (tito) Scaiano, J. (2010) Photoimaging and Lithographic Processes in Polymers, in Photochemistry and Photophysics of Polymer Materials (ed N. S. Allen), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470594179.ch12

Editor Information

  1. Faculty of Science and Engineering, Chemistry and Materials Department, Manchester Metropolitan University, Manchester, UK

Author Information

  1. Department of Chemistry, Center for Catalysis Research and Innovation, University of Ottawa, Ottawa, Ontario, Canada

Publication History

  1. Published Online: 18 MAR 2010
  2. Published Print: 10 MAR 2010

ISBN Information

Print ISBN: 9780470137963

Online ISBN: 9780470594179

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Keywords:

  • polymer photoimaging and lithographic processes;
  • chemically amplified photoresists;
  • polymers for deep-UV, vacuum-UV and extreme-UV photolithography

Summary

This chapter contains sections titled:

  • Photolithography with nonamplified resists

  • Chemically amplified photoresists

  • Ionic photoacid generators and their photochemistry

  • Nonionic PAGs and their photochemistry

  • Acid detection, quantification, and catalytic chain length

  • Polymers for deep-UV, vacuum-UV, and extreme-UV photolithography

  • Polymers for 248 nm photolithography

  • Polymers for 193 nm photolithography

  • Polymers for 157 nm optical lithography

  • Materials for next generation extreme-UV lithography

  • Photochemical reactions involving polymers in photoresist films

  • Photochemistry of PMMA

  • Photochemistry of fluorinated materials

  • Photochemistry of Si-containing polymers

  • Acknowledgments

  • References