14. E-Beam Lithography and Spontaneous Galvanic Displacement Reactions for Spatially Controlled MEF Applications

  1. Chris D. Geddes
  1. Luigi Martiradonna,
  2. S. Shiv Shankar and
  3. Pier Paolo Pompa

Published Online: 30 JUN 2010

DOI: 10.1002/9780470642795.ch14

Metal-Enhanced Fluorescence

Metal-Enhanced Fluorescence

How to Cite

Martiradonna, L., Shankar, S. S. and Pompa, P. P. (2010) E-Beam Lithography and Spontaneous Galvanic Displacement Reactions for Spatially Controlled MEF Applications, in Metal-Enhanced Fluorescence (ed C. D. Geddes), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470642795.ch14

Publication History

  1. Published Online: 30 JUN 2010
  2. Published Print: 24 MAY 2010

ISBN Information

Print ISBN: 9780470228388

Online ISBN: 9780470642795

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Keywords:

  • e-beam lithography;
  • spontaneous galvanic displacement reactions;
  • fluorophores;
  • opto-electronics;
  • biophysics

Summary

This chapter contains sections titled:

  • Introduction

  • E-Beam Lithography Approach to Metal Enhanced Fluorescence

  • Spontaneous Galvanic Displacement Reactions for MEF Substrates