Mechanical Properties of Cr-Si-N-O Thin Films Deposited by RF Reactive Unbalanced Magnetron Sputtering

  1. Tatsuki Ohji,
  2. Mrityunjay Singh and
  3. Sanjay Mathur
  1. Jun Shirahata1,
  2. Tetsutaro Ohori1,
  3. Hiroki Asami2,
  4. Tsuneo Suzuki1,
  5. Tadachika Nakayama1,
  6. Hisayuki Suematsu1 and
  7. Koichi Niihara1

Published Online: 19 NOV 2010

DOI: 10.1002/9780470944066.ch2

Advanced Processing and Manufacturing Technologies for Structural and Multifunctional Materials IV: Ceramic Engineering and Science Proceedings, Volume 31

Advanced Processing and Manufacturing Technologies for Structural and Multifunctional Materials IV: Ceramic Engineering and Science Proceedings, Volume 31

How to Cite

Shirahata, J., Ohori, T., Asami, H., Suzuki, T., Nakayama, T., Suematsu, H. and Niihara, K. (2010) Mechanical Properties of Cr-Si-N-O Thin Films Deposited by RF Reactive Unbalanced Magnetron Sputtering, in Advanced Processing and Manufacturing Technologies for Structural and Multifunctional Materials IV: Ceramic Engineering and Science Proceedings, Volume 31 (eds T. Ohji, M. Singh and S. Mathur), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470944066.ch2

Author Information

  1. 1

    Extreme Energy-Density Research Institute, Nagaoka University of Technology, 1603-1 Kamitomioka-cho, Nagaoka 940-2188, Japan

  2. 2

    Department of Mechanical Engineering, Tomakomai national college of Technology, 433 Nishikioka, Tomakomai 059-1275, Japan

Publication History

  1. Published Online: 19 NOV 2010
  2. Published Print: 27 SEP 2010

ISBN Information

Print ISBN: 9780470594735

Online ISBN: 9780470944066

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Keywords:

  • thin films;
  • radio frequency reactive unbalanced magnetron sputtering;
  • mechanical properties;
  • Rutherford backscattering;
  • scanning electron microscope

Summary

This chapter contains sections titled:

  • Introduction

  • Experimental Procedure

  • Results and Discussion

  • Conclusion

  • Acknowledgment