First Principle Molecular Dynamic Simulations of Oxygen Plasma Etching of Organosilicate Low Dielectric Materials

  1. Waltraud M. Kriven,
  2. Yanchun Zhou,
  3. Miladin Radovic,
  4. Sanjay Mathur and
  5. Tatsuki Ohji
  1. Jincheng Du and
  2. Mrunal Chaudhari

Published Online: 22 NOV 2010

DOI: 10.1002/9780470944103.ch12

Strategic Materials and Computational Design: Ceramic Engineering and Science Proceedings, Volume 31

Strategic Materials and Computational Design: Ceramic Engineering and Science Proceedings, Volume 31

How to Cite

Du, J. and Chaudhari, M. (2010) First Principle Molecular Dynamic Simulations of Oxygen Plasma Etching of Organosilicate Low Dielectric Materials, in Strategic Materials and Computational Design: Ceramic Engineering and Science Proceedings, Volume 31 (eds W. M. Kriven, Y. Zhou, M. Radovic, S. Mathur and T. Ohji), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470944103.ch12

Author Information

Publication History

  1. Published Online: 22 NOV 2010
  2. Published Print: 27 SEP 2010

ISBN Information

Print ISBN: 9780470921913

Online ISBN: 9780470944103

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