Detection of Amorphous Silica in Oxidized Maxthal Ti3SiC2 at 500 - 1000°C

  1. Waltraud M. Kriven,
  2. Yanchun Zhou,
  3. Miladin Radovic,
  4. Sanjay Mathur and
  5. Tatsuki Ohji
  1. W.K. Pang1,
  2. I.M. Low1,
  3. J.V. Hanna2 and
  4. J.P. Palmquist3

Published Online: 22 NOV 2010

DOI: 10.1002/9780470944103.ch18

Strategic Materials and Computational Design: Ceramic Engineering and Science Proceedings, Volume 31

Strategic Materials and Computational Design: Ceramic Engineering and Science Proceedings, Volume 31

How to Cite

Pang, W.K., Low, I.M., Hanna, J.V. and Palmquist, J.P. (2010) Detection of Amorphous Silica in Oxidized Maxthal Ti3SiC2 at 500 - 1000°C, in Strategic Materials and Computational Design: Ceramic Engineering and Science Proceedings, Volume 31 (eds W. M. Kriven, Y. Zhou, M. Radovic, S. Mathur and T. Ohji), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9780470944103.ch18

Author Information

  1. 1

    Centre for Materials Research, Department of Imaging and Applied Physics, Curtin University of, Technology, GPO Box U 1987, Perth WA, Australia

  2. 2

    Department of Physics, University of Warwick, Gibbet Hill Rd., Coventry CV4 7AL, UK

  3. 3

    Kanthal AB, Heating Systems R&D, P.O. Box 502, SE-734 27 Hallstahammar, Sweden

Publication History

  1. Published Online: 22 NOV 2010
  2. Published Print: 27 SEP 2010

ISBN Information

Print ISBN: 9780470921913

Online ISBN: 9780470944103

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