40. Mass Spectrometry in Semiconductor Research

  1. Mike S. Lee
  1. Stefan Flege and
  2. Wolfgang Ensinger

Published Online: 21 MAY 2012

DOI: 10.1002/9781118180730.ch40

Mass Spectrometry Handbook

Mass Spectrometry Handbook

How to Cite

Flege, S. and Ensinger, W. (2012) Mass Spectrometry in Semiconductor Research, in Mass Spectrometry Handbook (ed M. S. Lee), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118180730.ch40

Editor Information

  1. Milestone Development Services, USA

Author Information

  1. Department of Materials Science, Technische Universität Darmstadt, Darmstadt, Germany

Publication History

  1. Published Online: 21 MAY 2012
  2. Published Print: 18 APR 2012

Book Series:

  1. Wiley Series on Pharmaceutical Science and Biotechnology: Practices, Applications and Methods

Book Series Editors:

  1. Mike S. Lee

Series Editor Information

  1. Milestone Development Services, USA

ISBN Information

Print ISBN: 9780470536735

Online ISBN: 9781118180730

SEARCH

Keywords:

  • surface analysis and semiconductor research, SIMS, SNMS AMS, APT;
  • semiconductor processing, critical contamination levels of materials;
  • failure analysis, failed device analysis for verification of failures;
  • fractionation and laser parameters, obstacles to quantification;
  • characterization of high-k dielectric films, in semiconductor industry

Summary

This chapter contains sections titled:

  • Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

  • LA-ICP-MS

  • SSMS

  • GDMS

  • SIMS

  • Secondary Neutral Mass Spectrometry (SNMS)

  • Accelerator Mass Spectrometry (AMS)

  • APT

  • Outlook

  • List of Abbreviations

  • References