11. Formation of Organic Monolayers Through Wet Chemistry

  1. Franklin (Feng) Tao2 and
  2. Steven L. Bernasek3
  1. Damien Aureau and
  2. Yves J. Chabal

Published Online: 20 MAR 2012

DOI: 10.1002/9781118199770.ch11

Functionalization of Semiconductor Surfaces

Functionalization of Semiconductor Surfaces

How to Cite

Aureau, D. and Chabal, Y. J. (2012) Formation of Organic Monolayers Through Wet Chemistry, in Functionalization of Semiconductor Surfaces (eds F. (. Tao and S. L. Bernasek), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118199770.ch11

Editor Information

  1. 2

    Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN, USA

  2. 3

    Department of Chemistry, Princeton University, Princeton, NJ, USA

Author Information

  1. Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, USA

Publication History

  1. Published Online: 20 MAR 2012
  2. Published Print: 16 MAR 2012

ISBN Information

Print ISBN: 9780470562949

Online ISBN: 9781118199770



  • organic monolayer formation, and wet chemistry;
  • wet chemical, in semiconductor surface functionalization;
  • hydrosilylation of H-terminated Si surface, and HF etching;
  • H-terminated surface stability and selective reactivity;
  • halogen-terminated surface, two-step method


This chapter contains sections titled:

  • Introduction, Motivation, and Scope of Chapter

  • Techniques Characterizing Wet Chemically Functionalized Surfaces

  • Hydrosilylation of H-Terminated Surfaces

  • Electrochemistry of H-Terminated Surfaces

  • Use of Halogen-Terminated Surfaces

  • Alcohol Reaction with H-Terminated Si Surfaces

  • Outlook

  • Acknowledgments

  • References